Patent
Bypass loop gas flow calibration
William Daniel Bevers,Robert Francis Jones,Bennett J Ross,Joseph William Buckfeller,James L Flack +4 more
TLDR
In this article, apparatuses, methods and systems to monitor the performance of one or more mass flow controllers that supply gases to deposition, etching, and other manufacturing processes are described.Abstract:
Described herein are apparatuses, methods and systems to monitor the performance of one or more mass flow controllers that supply gases to deposition, etching, and other manufacturing processes. A bypass loop is provided in fluid connection from either the process line or the vent line. In the bypass loop is a flow detector, such as a digitized mass flow controller. The flow detector takes one or more measurements of flow of gas from a mass flow controller, and data from such one or more measurements is used to provide information about the accuracy and/or precision of the mass flow controller. Also disclosed are ways to correct for back pressure or back vacuum in the process line.read more
Citations
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Patent
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Wafer lift ring system for wafer transfer
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References
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Patent
Dynamic gas flow controller
TL;DR: In this article, the delivery of a gas from a reservoir to a semiconductor process chamber is controlled by a variable flow valve under the control of a self-calibrating, dynamic flow control circuit comprising of a flow control servo loop (flow control circuit) and a calibration circuit (calibration circuit).
Patent
Method for wide range gas flow system with real time flow measurement and correction
TL;DR: In this paper, a gas delivery system accurately measures and optionally regulates mass flow rate in real time, where a fluid conduit connects an inlet valve, calibration volume, flow restrictor, and outlet valve in series.
Patent
Method and apparatus for detecting and controlling mass flow
TL;DR: In this article, an empirically derived conversion function was derived by correlating the output signals of a mass flow instrument sensing the flow of a calibration fluid with the output signal of the mass flow instruments sensing the fluid flow of the process fluid.
Patent
System for manufacturing a semiconductor device
TL;DR: In this article, a gas supply system for supplying a gas into a reaction chamber is provided with a pulse valve, a mass flow controller and a back pressure controller, which are connected to a controller so that operations thereof are controlled by this controller.
Patent
Apparatus for mass flow measurement of a gas
TL;DR: In this article, a transducer assembly consisting of a pressure transducers and a signal modifying network is presented for measuring mass flow of a gas in a gas delivery system, which is used for calibrating mass flow controllers and the like.