A lithographic apparatus configured to project a patterned beam of radiation onto a target portion of a substrate is disclosed. The apparatus includes a first radiation dose detector and a second radiation dose detector, each detector comprising a secondary electron emission surface configured to receive a radiation flux and to emit secondary electrons due to the receipt of the radiation flux, the first radiation dose detector located upstream with respect to the second radiation dose detector viewed with respect to a direction of radiation transmission, and a meter, connected to each detector, to detect a current or voltage resulting from the secondary electron emission from the respective electron emission surface.

Lithographic apparatus, and device manufacturing method

An immersion projection optical system having, for example, a catadioptric and off-axis structure, reduces the portion of an image space filled with liquid (immersion liquid). The projection optical system, which projects a reduced image of a first plane onto a second plane through the liquid, includes a refractive optical element (Lp) arranged nearest to the second plane. The refractive optical element includes a light emitting surface (Lpb) shaped to be substantially symmetric with respect to two axial directions (XY-axes) perpendicular to each other on the second plane. The light emitting surface has a central axis (Lpba) that substantially coincides with a central axis (40a) of a circle (40) corresponding to a circumference of a light entering surface (Lpa) of the refractive optical element. The central axis of the light emitting surface is decentered in one of the two axial directions (Y-axis) from an optical axis (AX).

Projection optical system, exposure apparatus and exposure method

The disclosure generally relates to imaging optical systems that include a plurality of mirrors, which image an object field lying in an object plane in an image field lying in an image plane, where at least one of the mirrors has a through-hole for imaging light to pass through. The disclosure also generally relates to projection exposure installations that include such imaging optical systems, methods of using such projection exposure installations, and components made by such methods.

Imaging optical system

Described are computer-based surgical methods and apparatuses for a self- detecting kinematic assembly The self -detecting kinematic clamp assembly (100) detects and indicates a degradation in pose The self-detecting kinematic clamp assembly includes a tracking element (102) for tracking a pose of the kinematic clamp assembly The self -detecting kinematic clamp assembly includes a base portion (110) comprising a fixation device that is attachable to a rigid body, and a top portion (112) connected to the tracking element, the top portion being removably connected to the base portion The self- detecting kinematic clamp assembly includes a detection mechanism (350), the detection mechanism including three or more contact points (376, 378, 380) between the base potion and top portion and a mechanism that detects movement between one or more of the three or more contact points

Self-detecting kinematic clamp assembly

A system and method for forming encoded microparticles is described. One embodiment includes a method for forming a microparticle, the method comprising providing a pattern, wherein the pattern defines a code element, printing the pattern on a substrate to form a first code element within a microparticle region, printing the pattern on the substrate to form at least one successive code element, such that the first code element and the at least one successive code element are within the same microparticle region, wherein a code is formed by the first code element and any successive code elements.

Multiple step printing methods for microbarcodes

An exposure apparatus exposes, for example, a substrate for production of a working reticle through a master reticle on which a pattern is formed. The apparatus is provided with three support members for supporting the substrate substantially horizontally at three locations outside illuminated areas of the substrate, e.g., a pattern area, alignment mark areas, and information mark areas.

Exposure apparatus, microdevice, photomask, and exposure method

PROBLEM TO BE SOLVED: To form a high precision pattern even when a light transmissive substrate is exposed. SOLUTION: In the objective exposure system in which a substrate 4, e.g. for producing a working reticle is exposed through a master reticle with a formed pattern, the substrate 4 is provided with three first supporting members 52 which support the substrate 4 in a nearly horizontal state in three places except the illumination areas (pattern area 25, alignment mark areas MA1 and information mark areas MA2) of the substrate 4.

Katsuaki Ishimaru

Papers

Exposure apparatus, microdevice, photomask, and exposure method

Exposure system, micro-device, photomask and exposure method