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Nobuyuki Irie
Publications - 2
Citations - 32
Nobuyuki Irie is an academic researcher. The author has contributed to research in topics: Reticle & Photomask. The author has an hindex of 2, co-authored 2 publications receiving 32 citations.
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Patent
Exposure apparatus, microdevice, photomask, and exposure method
Nobuyuki Irie,Katsuaki Ishimaru +1 more
TL;DR: In this article, an exposure apparatus exposes a substrate for production of a working reticle through a master reticle on which a pattern is formed, and three support members for supporting the substrate substantially horizontally at three locations outside illuminated areas.
Patent
Exposure system, micro-device, photomask and exposure method
TL;DR: In this article, the problem of forming a high precision pattern even when a light transmissive substrate is exposed is solved by providing the substrate with three first supporting members 52 which support the substrate in a nearly horizontal state in three places except the illumination areas (pattern area 25, alignment mark areas MA1 and information mark area MA2).