K
Kunpeng Wei
Researcher at Tsinghua University
Publications - 37
Citations - 973
Kunpeng Wei is an academic researcher from Tsinghua University. The author has contributed to research in topics: Coaxial antenna & Microstrip antenna. The author has an hindex of 15, co-authored 33 publications receiving 668 citations. Previous affiliations of Kunpeng Wei include Huawei.
Papers
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Design of a Wideband Horizontally Polarized Omnidirectional Printed Loop Antenna
TL;DR: In this article, the authors proposed a novel wideband horizontally polarized omnidirectional printed loop antenna, which consists of a loop with periodical capacitive loading and a parallel stripline as an impedance transformer.
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Polarization-Orthogonal Co-frequency Dual Antenna Pair Suitable for 5G MIMO Smartphone With Metallic Bezels
TL;DR: In this paper, a spatial reuse dual antenna pair consisting of a split on the metallic bezel and a slot on the mainboard ground, where the slot is centered on the split, was proposed for 5G smartphones with metallic bezels.
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A MNG-TL Loop Antenna Array With Horizontally Polarized Omnidirectional Patterns
TL;DR: In this article, a horizontally polarized omnidirectional planar antenna that employs an artificial mu-negative transmission line (MNG-TL) is proposed, where reactive loading is inspired by the zeroth-order resonator (ZOR), which has a propagation constant of zero.
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A Novel Hybrid-Fed Patch Antenna With Pattern Diversity
TL;DR: In this paper, a hybrid-fed circular patch antenna operating with TM11 and TM01 modes is presented, which can operate at an overlapped frequency range for 2.4-GHz WLAN applications, while TM11 mode reveals good broadside radiation patterns and TM 01 mode shows monopole-like radiation patterns.
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Orthogonally Polarized Dual Antenna Pair With High Isolation and Balanced High Performance for 5G MIMO Smartphone
TL;DR: In this paper, a zero-ground-clearance dual antenna pair with high isolation and balanced high performance was proposed, where a T-shaped monopole intersects with a Tshaped slot that is etched on a large ground edge.