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M

M.A. Angadi

Researcher at Karnatak University

Publications -  9
Citations -  174

M.A. Angadi is an academic researcher from Karnatak University. The author has contributed to research in topics: Electrical resistivity and conductivity & Temperature coefficient. The author has an hindex of 7, co-authored 9 publications receiving 168 citations.

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Electrical properties of thin nickel films

TL;DR: In this paper, the electrical resistivity and the temperature coefficient of resistance (TCR) of vacuum-evaporated thin nickel films are reported for the thickness range 60-700 A.
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Electrical resistivity of thin palladium films

TL;DR: In situ electrical resistivity measurements in palladium films over the thickness range 25 A to 370 A were reported in this paper, where the Fuchs curve agreed with experimental p versus t curve for specularity parameter p = 06.
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The effect of the deposition rate on the electrical resistivity of thin tin films

TL;DR: In this article, the electrical resistivity of thin tin films in the thickness range 400-1600 A was studied for various deposition rates and the experimental results were in good agreement with the Mayadas-Shatzkes and the Fuchs-Sondheimer theories for lower and for higher film thickness respectively.