Pulsed-laser-induced and ion-beam-induced surface synthesis and modification of oxides, nitrides and carbides

In this paper, the third of a series of three reviewing the subject of laser microchemical processing — a potentially powerful technique for the fabrication of a variety of micro and opto-electronics devices — the main mechanisms of laser-induced alloying and dopinh in semiconductors and the etching of microstructures in a variety of materials are discussed. Many examples of the application of the laser based processing to integrated circuit repair and customization are presented.

Laser microfabrication of thin films: Part three

Nanomaterials: Laser-Based Processing in Liquid Media

UV laser etching processes for film layers used in silicon integrated circuits

Pattern formation techniques in photochemical etching

We have demonstrated submicrometer‐resolution lithography by ultraviolet laser‐induced radical etching. We previously showed that this method can provide highly specific and efficient etching of various refractory metal/insulator and semiconductor/insulator substrate combinations.

M. D. Tabat

Papers

Submicrometer-resolution etching of integrated circuit materials with laser-generated atomic fluorine