M
M.E.H. Maia da Costa
Researcher at Pontifical Catholic University of Rio de Janeiro
Publications - 80
Citations - 1348
M.E.H. Maia da Costa is an academic researcher from Pontifical Catholic University of Rio de Janeiro. The author has contributed to research in topics: X-ray photoelectron spectroscopy & Raman spectroscopy. The author has an hindex of 18, co-authored 72 publications receiving 1148 citations. Previous affiliations of M.E.H. Maia da Costa include State University of Campinas.
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X-ray photoelectron spectroscopy investigation of boron carbide films deposited by sputtering
TL;DR: The interpretation of the surface chemical states of amorphous boron carbide films as revealed by X-ray photoelectron spectroscopy (XPS) was investigated in this paper.
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Hydroxypropyl‐α‐Cyclodextrin‐Capped Palladium Nanoparticles: Active Scaffolds for Efficient Carbon‐Carbon Bond Forming Cross‐Couplings in Water
Jaqueline D. Senra,Luiz Fernando B. Malta,M.E.H. Maia da Costa,Ricardo C. Michel,Lucia C. S. Aguiar,Alessandro B. C. Simas,O. A. C. Antunes +6 more
TL;DR: In this paper, a new approach for the preparation of palladium nanoparticles in water from a renewable source, 2-hydroxypropyl-a-cyclodextrin (α-HPCD), which acts both as reductant and capping agent, is presented.
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Unveiling the Role of Oxidation Debris on the Surface Chemistry of Graphene through the Anchoring of Ag Nanoparticles
Andreia Fonseca de Faria,Diego Stéfani T. Martinez,Ana C.M. de Moraes,M.E.H. Maia da Costa,Eduardo B. Barros,Antonio G. Souza Filho,Amauri J. Paula,Oswaldo Luiz Alves +7 more
TL;DR: The surface microchemical environment of graphene oxide (GO) has so far been oversimplified for understanding practical purposes as discussed by the authors, and the amount as well as the accurate identification of each possible oxygenated group on the GO surface are difficult to describe due to the complex chemical nature of the oxidation reactions but also due to several intrinsic variables related to the production and chemical processing of GO-based materials.
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Structural and mechanical characterization of fluorinated amorphous-carbon films deposited by plasma decomposition of CF4–CH4 gas mixtures
TL;DR: Fluorinated amorphous-carbon films (a-C:F:H) were deposited by low-power rf capacitively coupled plasma-enhanced chemical-vapor deposition using CH4-CF4 gas mixtures as discussed by the authors.
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Film growth and relationship between microstructure and mechanical properties of a-C:H:F films deposited by PECVD
TL;DR: In this article, the effects of some deposition parameters (partial pressure of CF4 and self-bias voltage) on the microstructure, mechanical and tribological properties of a-C:H:F films are presented.