The phase-shifting mask consists of a normal transmission mask that has been coated with a transparent layer patterned to ensure that the optical phases of nearest apertures are opposite. Destructive interference between waves from adjacent apertures cancels some diffraction effects and increases the spatial resolution with which such patterns can be projected. A simple theory predicts a near doubling of resolution for illumination with partial incoherence σ < 0.3, and substantial improvements in resolution for σ < 0.7. Initial results obtained with a phase-shifting mask patterned with typical device structures by electron-beam lithography and exposed using a Mann 4800 10× tool reveals a 40-percent increase in usuable resolution with some structures printed at a resolution of 1000 lines/mm. Phase-shifting mask structures can be used to facilitate proximity printing with larger gaps between mask and wafer. Theory indicates that the increase in resolution is accompanied by a minimal decrease in depth of focus. Thus the phase-shifting mask may be the most desirable device for enhancing optical lithography resolution in the VLSI/VHSIC era.

Improving resolution in photolithography with a phase-shifting mask

Continuous profile writing by electron and optical lithography

A phase mask (15) for modulating a collimated light beam passing therethrough, the light beam being diffracted to photoinduce a refractive index profile in a photosensitive optical medium, the phase mask (15) comprises a substrate (17) having an outer surface provided with a plurality of parallel grating corrugations (19). The grating corrugations (19) have a non-uniform relief depth across the outer surface for photoinducing a non-uniform refractive index profile in the photosensitive optical medium. The non-uniform relief depth is defined by a variable thin film layer (21) of variable thickness overlaying the substrate (17). The grating corrugations (19) can either be etched into the variable thin film layer (21) itself or be etched into the substrate (17), with the variable thin film layer (21) being deposited on it after etching. Methods to make such phase masks are also provided.

Phase mask with spatially variable diffraction efficiency

The optical system configuration and design of a dot matrix holographic printer that can create image grating pixels of variable size, arbitrary pitch, and discretionary angle on a photoresist plate are presented. With the capability to vary spot size, grating orientation, and grating pitch on the fly, this newly developed holographic printer can apply a prespecified color at each specific viewing angle. Diffractive images with various visual effects and the wide color range that are possible by use of this system are examined in detail.

Optical configuration and color-representation range of a variable-pitch dot matrix holographic printer

Polymer optics have gained increasing importance in recent years. With advancing requirements for the optical components, the fabrication process remains a challenge. In particular, the fabrication of the mold inserts for the replication process is crucial for obtaining high-quality optical components. This review focuses on fabrication technologies for optical mold inserts. Thereby, two main types of technologies can be distinguished: fabrication methods to create mold inserts with optical surface quality and methods to create optical microstructures. Since optical mold inserts usually require outstanding form accuracies and surface qualities, a focus is placed on these factors. This review aims to give an overview of available methods as well as support the selection process when a fabrication technology is needed for a defined application. Furthermore, references are given to detailed descriptions of each technology if a deeper understanding of the processes is required.

https://www.mdpi.com/2072-666X/10/4/233/pdf

M. J. Verheijen

Papers

E-beam lithography for digital holograms