Journal ArticleDOI
E-beam lithography for digital holograms
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This article is published in Journal of Modern Optics.The article was published on 1993-04-01. It has received 35 citations till now. The article focuses on the topics: Blazed grating & Lithography.read more
Citations
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Journal Article
Improving resolution in photolithography with a phase-shifting mask
TL;DR: The phase-shifting mask as mentioned in this paper consists of a normal transmission mask that has been coated with a transparent layer patterned to ensure that the optical phases of nearest apertures are opposite.
Journal ArticleDOI
Continuous profile writing by electron and optical lithography
TL;DR: In this article, laser beam writing, electron beam writing and optical half-tone mask writing by shaped optical beams are discussed and compared to each other, as well as possible advantages and obstacles for selected applications.
Patent
Phase mask with spatially variable diffraction efficiency
TL;DR: In this article, a phase mask is proposed for modulating a collimated light beam passing therethrough, the light beam being diffracted to photoinduce a non-uniform refractive index profile in a photosensitive optical medium, the phase mask comprises a substrate (17) having an outer surface provided with a plurality of parallel grating corrugations (19).
Journal ArticleDOI
Optical configuration and color-representation range of a variable-pitch dot matrix holographic printer
Chih-Kung Lee,Jeremy W.J. Wu,Sheng-Lie Yeh,Chih-Wen Tu,Yi-An Han,Eric Hong-Zong Liao,Linus Ying-Yueh Chang,I-En Tsai,Hsiu-Hung Lin,Jeffrey Chi-Tang Hsieh,Julie Tsai-Wei Lee +10 more
TL;DR: The optical system configuration and design of a dot matrix holographic printer that can create image grating pixels of variable size, arbitrary pitch, and discretionary angle on a photoresist plate are presented.
Journal ArticleDOI
Review on Fabrication Technologies for Optical Mold Inserts.
TL;DR: This review focuses on fabrication technologies for optical mold inserts and aims to give an overview of available methods as well as support the selection process when a fabrication technology is needed for a defined application.
References
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Journal Article
Improving resolution in photolithography with a phase-shifting mask
TL;DR: The phase-shifting mask as mentioned in this paper consists of a normal transmission mask that has been coated with a transparent layer patterned to ensure that the optical phases of nearest apertures are opposite.
Journal ArticleDOI
Improving resolution in photolithography with a phase-shifting mask
TL;DR: The phase-shifting mask as mentioned in this paper consists of a normal transmission mask that has been coated with a transparent layer patterned to ensure that the optical phases of nearest apertures are opposite.
Journal ArticleDOI
Computer Generated Holograms for Testing Optical Elements
Alan J. MacGovern,J. C. Wyant +1 more
TL;DR: The application of computer generated holograms to the interferometric testing of aspheric optical elements has been investigated, and it has been shown that they provide a convenient and practical method of producing an asPheric reference wavefront.
Journal ArticleDOI
EBES: A practical electron lithographic system
TL;DR: The electron beam exposure system (EBES) as discussed by the authors combines continuous translation of the mask or wafer substrate with periodic deflection of the electron beam in a raster-scan mode of exposure.
Journal ArticleDOI
Fabricating binary optics: Process variables critical to optical efficiency
TL;DR: In this paper, a mask set that incorporates ten different lenslet designs as single elements and as 10×10 arrays was used to quantitatively assess the effects of process variables, and the optical efficiency was evaluated as a function of the focal length and compared to theoretical predictions.