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Showing papers by "Madhavi Z. Martin published in 1995"

Journal Article•DOI•
Enhanced Negative Ion Formation in ArF-Laser-Irradiated Methane: Possible Implications for Plasma Processing Discharges

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Lal A. Pinnaduwage1, Lal A. Pinnaduwage2, Madhavi Z. Martin1, Madhavi Z. Martin2, L. G. Christophorou1, L. G. Christophorou3 •
University of Tennessee1, Oak Ridge National Laboratory2, National Institute of Standards and Technology3
01 Jan 1995-Contributions To Plasma Physics
TL;DR: In this paper, the authors investigated the role of laser-excited superexcited states of CH 4 (or other excited states to which these convert) in the observed enhanced electron attachment, and found that predominantly H - ions are produced via this process.
Abstract: Oberservation of enhanced electron attachment to ArF-excimer-laser irradiated methane is reported. Preliminary evidence is presented that laser-excited superexcited states of CH 4 (or other excited states to which these convert) are responsible for the observed enhanced electron attachment, and, that predominantly H - ions are produced via this process. The possible significance of this process for plasma processing discharges using CH 4 and its mixtures is indicated.

8 citations