Michael J. Leeson

TL;DR: In this paper, the authors simulated acid generation induced by EUV photons in poly(4-hydroxystyrene) with 10wt% triphenylsulfonium triflate and clarified the extent of resolution blur in latent acid images and theoretical acid generation efficiency.

TL;DR: In this article, the relative dependence of acid yield generated in polystyrene derivatives on the exposure to extreme-ultraviolet (EUV) was evaluated and the dependence was similar to that of EB resists.

TL;DR: In this article, the authors present the results of a full-field extreme ultraviolet (EUV) pellicle for reticle protection and defect mitigation, which comprises a 50 nm Si membrane attached to a wire-grid.

TL;DR: In this paper, a series of polymers with a comb architecture were prepared where the poly(olefin sulfone) backbone was designed to be highly sensitive to extreme ultraviolet (EUV) radiation, while the well-defined poly(methyl methacrylate) (PMMA) arms were incorporated with the aim of increasing structural stability.

TL;DR: A series of high-performance polycarbonates have been prepared with glass-transition temperatures and decomposition temperatures that are tunable by varying the repeat-unit chemical structure to achieve patterning and the importance of resist-developer interactions for maximizing image quality has been demonstrated.