M
Mika Valden
Researcher at Tampere University of Technology
Publications - 116
Citations - 6337
Mika Valden is an academic researcher from Tampere University of Technology. The author has contributed to research in topics: X-ray photoelectron spectroscopy & Adsorption. The author has an hindex of 26, co-authored 107 publications receiving 5824 citations. Previous affiliations of Mika Valden include Ben-Gurion University of the Negev & Texas A&M University.
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Journal ArticleDOI
Onset of Catalytic Activity of Gold Clusters on Titania with the Appearance of Nonmetallic Properties
Mika Valden,X. Lai,D. W. Goodman +2 more
TL;DR: Results suggest that supported clusters, in general, may have unusual catalytic properties as one dimension of the cluster becomes smaller than three atomic spacings.
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Scanning tunneling microscopy studies of metal clusters supported on TiO2 (110): Morphology and electronic structure
TL;DR: In this paper, a review of the recent scanning tunneling microscopy (STM) studies on nanoclusters supported on TiO2(110) is presented, focusing on the system Au TiO 2 (110).
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Effect of Ce-Zr mixed oxides on the chemical state of Rh in alumina supported automotive exhaust catalysts studied by XPS and XRD
TL;DR: In this paper, the performance of a number of γ-Al2O3 supported Rh catalysts containing Ce-Zr mixed oxides in various proportions were investigated by different manufacturing methods and aging was performed in air at 1000°C for 3h.
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Oxygen adsorption-induced nanostructures and island formation on Cu{100}: Bridging the gap between the formation of surface confined oxygen chemisorption layer and oxide formation
TL;DR: It is demonstrated that the (2sqrt[2]xsqrt [2])R45 degrees-O reconstruction is relatively inert in the low pressure regime, and the formation of well-ordered two-dimensional Cu-O islands and their nanostructure appear to be critical to the onset of further migration of oxygen atoms deeper into copper and subsequent Cu(2)O formation in the high pressure regime.
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Improved Stability of Atomic Layer Deposited Amorphous TiO2 Photoelectrode Coatings by Thermally Induced Oxygen Defects
TL;DR: A detailed analysis of two methods of modifying an undoped thin film of atomic layer deposited a-TiO2 without an electrocatalyst to affect its performance in water splitting reaction as a protective photoelectrode coating preserves the amorphous structure of the film.