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Myungwoong Kim

Researcher at Inha University

Publications -  86
Citations -  2343

Myungwoong Kim is an academic researcher from Inha University. The author has contributed to research in topics: Copolymer & Graphene. The author has an hindex of 25, co-authored 85 publications receiving 1870 citations. Previous affiliations of Myungwoong Kim include Hanyang University & Wisconsin Alumni Research Foundation.

Papers
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Journal ArticleDOI

Fabrication and Characterization of Large-Area, Semiconducting Nanoperforated Graphene Materials

TL;DR: The fabrication of nanoperforated graphene materials with sub-20-nm features using cylinder-forming diblock copolymer templates across >1 mm(2) areas is demonstrated to facilitate applications of graphene in electronics, optoelectronics, and sensing.
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Light-Driven Reversible Modulation of Doping in Graphene

TL;DR: A route to noncovalently latch dipolar molecules on graphene to create stable chromophore/graphene hybrids where molecular transformation can be used as an additional handle to reversibly modulate doping while retaining high mobilities is reported.
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Thiol-functionalized cellulose nanofiber membranes for the effective adsorption of heavy metal ions in water.

TL;DR: The fabrication of a thiol-functionalized cellulose nanofiber membrane that can effectively adsorb heavy metal ions is reported, highlighting the significance of surface functionality on biocompatible, nontoxic, and sustainable cellulose materials to expand their potential and applicability towards water remediation applications.
Journal ArticleDOI

From Self-Assembled Monolayers to Coatings: Advances in the Synthesis and Nanobio Applications of Polymer Brushes

TL;DR: In this paper, the authors describe the latest advances in synthesis, characterization, and applications of polymer brushes, which meet criteria such as: (i) Efficient and fast grafting, (ii) Applicability on a wide range of substrates; and (iii) Precise control of surface initiator concentration and hence, chain density.
Patent

Methods of fabricating large-area, semiconducting nanoperforated graphene materials

TL;DR: In this paper, the etch mask comprises a pattern-defining block copolymer layer, and can optionally also comprise a wetting layer and a neutral layer, which can be used to define a periodic array of holes over a single sheet of graphene or a plurality of graphene sheets.