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Naoya Hayashi
Researcher at Dai Nippon Printing
Publications - 168
Citations - 1026
Naoya Hayashi is an academic researcher from Dai Nippon Printing. The author has contributed to research in topics: Photolithography & Lithography. The author has an hindex of 14, co-authored 167 publications receiving 1019 citations.
Papers
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100nm-Alt.PSM structure discussion for ArF lithography
TL;DR: In this article, a side-etching method has been used for such structure of Alt.PSMs and a single trench structure for the mass-production of KrF lithography.
Proceedings ArticleDOI
Phase controllability improvement for alternating phase shift mask
TL;DR: In this article, the phase uniformity and mean value cold of etched quartz shifters were controlled by using an alternating phase shift mask with a 2-step etching process, which achieved a phase uniformization of 1.9% by choosing an adequate material.
Proceedings ArticleDOI
Performance of EBeyeM for EUV mask inspection
Shinji Yamaguchi,Masato Naka,Takashi Hirano,Masamitsu Itoh,Motoki Kadowaki,Tooru Koike,Yuichiro Yamazaki,Kenji Terao,Masahiro Hatakeyama,Kenji Watanabe,Hiroshi Sobukawa,Takeshi Murakami,Tsutomu Karimata,Kiwamu Tsukamoto,Hayashi Takehide,Ryo Tajima,Norio Kimura,Naoya Hayashi +17 more
TL;DR: In this paper, an EUV mask inspection tool, EBeyeM for 2X nm technology node, was developed to detect defects with size of 20 nm and 2 hours in 100 mm square for particle inspection.
Proceedings ArticleDOI
EUVL practical mask structure with light shield area for 32nm half pitch and beyond
Takashi Kamo,Hajime Aoyama,Toshihiko Tanaka,Osamu Suga,Tsukasa Abe,Tadahiko Takikawa,Naoya Hayashi,Tsutomu Shoki,Youichi Usui,Morio Hosoya +9 more
TL;DR: In this paper, the effect of mask structure with light shield area on the printability in EUV lithography was studied, and two types of masks with very thin absorber and light shield areas structure were proposed and evaluated.
Proceedings ArticleDOI
Development of EB inspection system EBeyeM for EUV mask
Takashi Hirano,Shinji Yamaguchi,Masato Naka,Masamitsu Itoh,Motoki Kadowaki,Tooru Koike,Yuuichiro Yamazaki,Kenji Terao,Masahiro Hatakeyama,Hiroshi Sobukawa,Takeshi Murakami,Kiwamu Tsukamoto,Hayashi Takehide,Kenji Watanabe,Norio Kimura,Naoya Hayashi +15 more
TL;DR: In this paper, a new electron beam inspection system, named EBeyeM, which features high speed and high resolution inspection for EUV mask was developed, and the performance of this system was evaluated.