Yuichiro Yamazaki

TL;DR: An electron beam inspection system of the image projection type includes a primary electron optical system for shaping an electron beam emitted from an electron gun into a rectangular configuration and applying the shaped electron beam to a sample surface to be inspected as mentioned in this paper.

TL;DR: In this paper, a charged particle beam system consisting of a charged beam source, a condenser lens, a scanning deflecting device, an objective lens and a secondary electron detector is presented.

TL;DR: In this article, a scanning electron beam is formed as a rectangular electron beam and pixel signals corresponding to a number of pixels equal to the aspect ratio of the rectangular beam are simultaneously output.

TL;DR: In this paper, a method of repairing a bump defect of a structure obtained by forming a predetermined pattern on a substrate, having the steps of forming a first thin film consisting of a material different from that of the substrate on the substrate around the bump defect or close to the bump defects, forming a second thin film on the bumped defect and flattening an upper surface of the second thin thin film, performing simultaneous removal of the bumps defect and the thin films on an upper portion of the projecting defect using a charged particle beam.

TL;DR: In this article, a charged beam apparatus consisting of a source tank provided outside the column and containing a plasma source, a plasma generating apparatus for generating plasma from the source tank, gate valves and an exhausting pump for introducing plasma generated by the plasma generator into the column, and an O-ring for restricting a passage of plasma in the column such that those portions of cleaning portions to be cleaned to which internal contaminants stick are mainly exposed to plasma.