N
Nitin Pathak
Researcher at Applied Materials
Publications - 6
Citations - 66
Nitin Pathak is an academic researcher from Applied Materials. The author has contributed to research in topics: Substrate (printing) & Volume of fluid method. The author has an hindex of 3, co-authored 6 publications receiving 60 citations. Previous affiliations of Nitin Pathak include Indian Institute of Science.
Papers
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Journal ArticleDOI
Effects of mould filling on evolution of the solid-liquid interface during solidification
TL;DR: In this article, the role of residual flow strength and temperature gradients within the solidifying domain, caused by the filling process, on the evolution of solidification interface is investigated.
Journal ArticleDOI
Effects of the filling process on the evolution of the mushy zone and macrosegregation in alloy casting
TL;DR: In this paper, a numerical model of the entire casting process starting from the mould filling stage to complete solidification is presented, taking into account any phase change taking place during the filling process.
Patent
New susceptor design to reduce edge thermal peak
Schubert S. Chu,Shah Kartik,Anhthu Ngo,Karthik Ramanathan,Nitin Pathak,Nyi O. Myo,Paul Brillhart,Richard O. Collins,Kevin Joseph Bautista,Edric Tong,Cong Zhepeng,Anzhong Chang,Kin Pong Lo,Manish Hemkar +13 more
TL;DR: In this paper, the authors describe a susceptor for thermal processing of semiconductor substrates, which includes a first rim surrounding and coupled to an inner region, and a second rim disposed between the inner rim and the first rim.
Patent
Flat susceptor with grooves for minimizing temperature profile across a substrate
Shah Kartik,Schubert S. Chu,Nyi O. Myo,Karthik Ramanathan,Richard O. Collins,Cong Zhepeng,Nitin Pathak +6 more
TL;DR: In this paper, a susceptor is provided and includes a first major surface opposing a second major surface, and a plurality of contact structures disposed on the first major surfaces, each of the contact structures being at least partially surrounded by one or more of radially oriented grooves and an annular groove.
Patent
Semiconductor processing chambers and methods for cleaning the same
Nitin Pathak,Zhang Yuxing,Tuan Anh Nguyen,Kalyanjit Ghosh,Bansal Amit Kumar,Rocha Juan Carlos +5 more
TL;DR: In this paper, an isolating assembly may include an outer isolating member coupled with the metal ring member, which may at least part define a chamber wall, and a plurality of openings configured to provide fluid access into a radial gap between the ring member and the inner isolating members.