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Nobuo Fujiwara
Researcher at Renesas Electronics
Publications - 7
Citations - 306
Nobuo Fujiwara is an academic researcher from Renesas Electronics. The author has contributed to research in topics: Etching (microfabrication) & Shallow trench isolation. The author has an hindex of 5, co-authored 7 publications receiving 290 citations. Previous affiliations of Nobuo Fujiwara include Mitsubishi.
Papers
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Journal ArticleDOI
Developments of Plasma Etching Technology for Fabricating Semiconductor Devices
TL;DR: In this paper, the progress made in plasma etching technologies is described from the viewpoint of requirements for the manufacturing of devices, and critical applications of RIE, isotropic etching, and plasma ashing/cleaning to form precisely controlled profiles of high-aspect-ratio contacts (HARC), gate stacks, and shallow trench isolation (STI) in the front end of line (FEOL) are described in detail.
Journal ArticleDOI
Gate CD Control Considering Variation of Gate and STI Structure
TL;DR: In this article, a fab-wide advanced process control system was developed to control the critical dimension (CD) of gate electrode length in semiconductors, and a model equation that predicts the gate CD was also used to perform a factor analysis of gate CD variation.
Patent
Semiconductor device having a layered wiring structure with hard mask covering
TL;DR: In this paper, a hard mask material 2 such as a silicon oxide film is formed on an aluminum alloy film 3 by patterning in the form of a thick film wiring 6 followed by etching the aluminum alloy material 3 to a given depth through the mask.
Journal ArticleDOI
Suppression of 193-nm photoresist deformation by H2 addition to fluorocarbon plasma in via-hole etching
Kazumasa Yonekura,Kazunori Yoshikawa,Yuji Fujiwara,Shigenori Sakamori,Nobuo Fujiwara,Takayoshi Kosaka,Mitsuhiro Ohkuni,Kenji Tateiwa +7 more
Journal ArticleDOI
Control of oxidation on NiSix during etching and ashing processes
Shigenori Sakamori,Kazumasa Yonekura,Nobuo Fujiwara,T. Kosaka,Mitsuhiro Ohkuni,Kenji Tateiwa +5 more
TL;DR: In this article, the oxidation on nickel silicide (NiSi x ) during plasma etching and oxygen ashing is investigated for stable contact resistance on NiSi x, exposed by various processes is observed by X-ray photoelectron spectroscopy.