Osamu Tabata

TL;DR: In this article, the tetramethyl ammonium hydroxide (TMAH, (CH3)4NOH) was used for silicon anisotropic etching solutions with various concentrations from 5 to 40 wt.% and temperatures from 60 to 90 °C.

TL;DR: Anisotropic etching characteristics of tetramethyl ammonium hydroxide (TMAH) such as the dependences of the etching rates of (100), (110) and (111) crystal planes on temperature and concentration, the selectivity to SiO 2 and Si 3 N 4, electrochemical etching properties, aluminum etching rate dependences on pH and conductivity and the effect of potassium ion addition are reviewed as mentioned in this paper.

TL;DR: In this paper, the internal stress and Young's modulus of thin polysilicon films are determined by measuring the deflection versus pressure of rectangular membranes made of them, showing that the rectangular membrane load-deflection technique could be utilized to measure the internal tensor strength of films deposited onto low pressure chemical vapor deposition (LPCVD) silicon nitride membranes.

TL;DR: In this article, a tensile tester using an electrostatic-force grip was developed to evaluate the tensile strength and the reliability of thin-film materials, and the tester was constructed in a scanning electron microscope (SEM) chamber for in situ observation and was applied for tensile testing of polycrystalline silicon (poly-Si) thin films.

TL;DR: In this article, a tensile tester using an electrostaticforce grip was developed to evaluate the tensile strength and the reliability of thin-film materials, which was constructed in a scanning electron microscope (SEM) chamber for observation and was applied for tensile testing of polycrystalline silicon (poly-Si) thin films with dimensions of 30-300 m long, 2-5 m wide, and 2 m thick.