Gallium nitride (GaN) and its allied binaries InN and AIN as well as their ternary compounds have gained an unprecedented attention due to their wide-ranging applications encompassing green, blue, violet, and ultraviolet (UV) emitters and detectors (in photon ranges inaccessible by other semiconductors) and high-power amplifiers. However, even the best of the three binaries, GaN, contains many structural and point defects caused to a large extent by lattice and stacking mismatch with substrates. These defects notably affect the electrical and optical properties of the host material and can seriously degrade the performance and reliability of devices made based on these nitride semiconductors. Even though GaN broke the long-standing paradigm that high density of dislocations precludes acceptable device performance, point defects have taken the center stage as they exacerbate efforts to increase the efficiency of emitters, increase laser operation lifetime, and lead to anomalies in electronic devices. The p...

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Luminescence properties of defects in GaN

REVIEW High-efficiency light-emitting diodes emitting amber, green, blue, and ultraviolet light have been obtained through the use of an InGaN active layer instead of a GaN active layer. The localized energy states caused by In composition fluctuation in the InGaN active layer are related to the high efficiency of the InGaN-based emitting devices. The blue and green InGaN quantum-well structure light-emitting diodes with luminous efficiencies of 5 and 30 lumens per watt, respectively, can be made despite the large number of threading dislocations (1 x 10(8) to 1 x 10(12) cm-2). Epitaxially laterally overgrown GaN on sapphire reduces the number of threading dislocations originating from the interface of the GaN epilayer with the sapphire substrate. InGaN multi-quantum-well structure laser diodes formed on the GaN layer above the SiO2 mask area can have a lifetime of more than 10,000 hours. Dislocations increase the threshold current density of the laser diodes.

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The Roles of Structural Imperfections in InGaN-Based Blue Light-Emitting Diodes and Laser Diodes

Recent advances in fabrication technologies for the semiconducting nitrides of the group III elements have led to commercially available, high-efficiency solid-state devices that emit green and blue light Light-emitting diodes based on these materials should find applications in flat-panel displays, and blue and ultraviolet laser diodes promise high-density optical data storage and high-resolution printing

Nitride-based semiconductors for blue and green light-emitting devices

Highly efficient light-emitting diodes (LEDs) emitting ultraviolet (UV), blue, green, amber and red light have been obtained through the use of InGaN active layers instead of GaN active layers. Red LEDs with an emission wavelength of 675 nm, whose emission energy was almost equal to the band-gap energy of InN, were fabricated. The dependence of the emission wavelength of the red LED on the current (blue shift) is dominated by both the band-filling effect of the localized energy states and the screening effect of the piezoelectric field. In the red LEDs, a phase separation of the InGaN layer was clearly observed in the emission spectra, in which blue and red emission peaks appeared. In terms of the temperature dependence of the LEDs, InGaN LEDs are superior to the conventional red and amber LEDs due to a large band offset between the active and cladding layers. The localized energy states caused by In composition fluctuation in the InGaN active layer contribute to the high efficiency of the InGaN-based emitting devices, in spite of the large number of threading dislocations and a large effect of the piezoelectric field. The blue and green InGaN-based LEDs had the highest external quantum efficiencies of 18% and 20% at low currents of 0.6 mA and 0.1 mA, respectively.

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Characteristics of InGaN-Based UV/Blue/Green/Amber/Red Light-Emitting Diodes

A model to explain the observed low transverse mobility in GaN by scattering of electrons at charged dislocation lines is proposed. Filled traps along threading dislocation lines act as Coulomb scattering centers. The statistics of trap occupancy at different doping levels are investigated. The theoretical transverse mobility from Coulomb scattering at charged traps is compared to experimental data. Due to the repulsive potential around the charged dislocation lines, electron transport parallel to the dislocations is unaffected by the scattering at charged dislocation lines.

Scattering of electrons at threading dislocations in GaN

The spatial dependence of the luminescence intensities at the band edge (364 nm) and at the ‘‘yellow’’ defect‐band (centered at 560 nm) regions for epitaxial GaN films have been studied using cathodoluminescence microscopy at room temperature. The films were grown by metalorganic chemical vapor deposition on (0001) sapphire substrates and were not intentionally doped. Significant nonuniformities in the band‐to‐band and in the yellow band emissions were observed. Yellow luminescence in small crystallites appears to originate from extended defects inside the grains and at low‐angle grain boundaries. The size of band‐to‐band emission sites correlates with low‐angle grain sizes observed by transmission electron microscopy.

P. J. Wright

Papers

Spatial distribution of the luminescence in GaN thin films