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Peter Panjan

Researcher at Jožef Stefan Institute

Publications -  225
Citations -  4587

Peter Panjan is an academic researcher from Jožef Stefan Institute. The author has contributed to research in topics: Sputtering & Coating. The author has an hindex of 36, co-authored 215 publications receiving 4019 citations. Previous affiliations of Peter Panjan include University of Ljubljana.

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Industrial applications of CrN (PVD) coatings, deposited at high and low temperatures

TL;DR: In this article, the results and performance tests were compared with the available data, mostly published on forming, milling, deep drawing of copper, nickel and titanium and their alloys, and on die casting of aluminium and Al-alloys.
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PVD coatings as an environmentally clean alternative to electroplating and electroless processes

TL;DR: In this article, the first positive results on the replacement of electrodeposited nickel on aluminium substrates and hard chrome on soft iron are also reported in the Slovenian automotive industry, where wear and corrosion tests were performed with iron cores, coated with PVD CrN coating.
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Oxidation of TiN, ZrN, TiZrN, CrN, TiCrN and TiN/CrN multilayer hard coatings reactively sputtered at low temperature

TL;DR: In this paper, all the coatings and multilayer structures were deposited in a Sputron plasma-beam-sputtering apparatus at a temperature below 150 °C on polished alumina substrates (Ra= 25 nm) and polished tool steel discs.
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Growth defects in PVD hard coatings

TL;DR: In this article, the influence of different types of substrate materials, the substrate position in the vacuum chamber, pretreatment and deposition parameters on defect density was analyzed using a 3D stylus profilometer and other analytical techniques.
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Review of Growth Defects in Thin Films Prepared by PVD Techniques

TL;DR: In this article, the authors summarized current knowledge of growth defects in physical vapor deposition (PVD) coatings and discussed the effect of these defects on the quality of optical coatings, thin layers for semiconductor devices, and wear, corrosion, and oxidation resistant coatings.