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Qing Ma

Researcher at Intel

Publications -  105
Citations -  4761

Qing Ma is an academic researcher from Intel. The author has contributed to research in topics: Layer (electronics) & Thin film. The author has an hindex of 30, co-authored 98 publications receiving 4583 citations. Previous affiliations of Qing Ma include University of California, Santa Barbara.

Papers
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Size dependent hardness of silver single crystals

TL;DR: In this paper, the authors measured the hardness of a thin epitaxial gold film embedded in the silver layers and found that the deformation was primarily restricted to the sharp edges of the indentation.
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Adhesion and debonding of multi-layer thin film structures

TL;DR: In this paper, a fracture mechanics technique to quantitatively measure the adhesion or interfacial fracture resistance of interfaces in thin film structures is described, which is expected to have important implications for long term device reliability.
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Stress Measurement in Single-Crystal and Polycrystalline Ceramics Using Their Optical Fluorescence

TL;DR: In this article, a general methodology is developed for determining the state of stress and the numerical value of the stresses from observed shifts and broadening of optical fluorescence lines, based on the piezospectroscopic properties of single crystals.
Patent

Structures and processes for fabricating moisture resistant chip-on-flex packages

TL;DR: A chip-on-flex package as discussed by the authors includes at least one moisture barrier layer to prevent metal corrosion and delamination of flex component layers, and a heat dissipation device may also be incorporated into the chip on-flex package.
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Piezospectroscopic Determination of Residual Stresses in Polycrystalline Alumina

TL;DR: In this article, the authors measured the residual stresses created in polycrystalline aluminum oxide as a result of its constrained anisotropic thermal contraction using the technique of piezospectroscopy using the fluorescence from trace Cr[sup 3+] impurities.