A photoconductive imaging member comprised of a substrate, a photogenerating layer, and thereover a charge transport layer comprised of a charge transport component or components, a polymer binder and metal oxide particles, wherein said metal oxide particles contain or are attached with or to a silane or a siloxane, or alternatively a polytetrafluoroethylene.

Photoconductive imaging members

This invention relates to an improvement in an electrophotographic recording material comprising an electrically conductive support, optionally an insulating intermediate layer, and a photoconductive layer composed of at least one layer comprising charge carrier-producing and charge transporting compounds, a binder, and conventional additives, the improvement that the recording material comprises a 75 to 250 μm thick support, and, in the form of a photoconductor web, is sufficiently flexible that it is not prone to the formation of hairline cracks when repeatedly conducted over rollers of at least 12 mm diameter, said binder being a cellulose nitrate with a viscosity of 400±25 cPoises at concentrations between about 4 and 12 percent in a 5 percent aqueous acetone solution, according to DIN 53 179 (standard type 4-12).

Electrophotographic recording material

The present invention relates to polymer-based micro-electro-mechanical system (MEMS) technology suitable for the fabrication of integrated microfluidic systems, particularly medical and chemical diagnostics system, ink-jet printer head, as well as any devices that requires liquid- or gas-filled cavities for operation. The integrated microfluidic systems may consist of pumps, valves, channels, reservoirs cavities, reaction chambers, mixers, heaters, fluidic interconnects, diffusers, nozzles, and other microfluidic components on top of a regular circuit substrate. This technology is vastly superior than any alternatives available such as glass-based, polysilicon-based MEMS technology as well as hybrid `circuit board` technology because of its simple construction low cost, low temperature processing, and its ability to integrate any electronic circuitry easily along with the fluidic parts.

Polymer-based micromachining for microfluidic devices

The present invention is directed to a process for device fabrication and resist materials that are used in the process. The resist material contains a polymer that contains monomeric units that contain alicyclic formate moieties, and at least one other type of monomeric unit. The polymer may be formed by polymerization or by polymer modification of an existing polymer, and the resulting polymer either has alicyclic moieties incorporated into the polymer backbone or pendant to the polymer backbone via saturated hydrocarbon linkages. A preferred polymerization process is free radical polymerization, in which other monomers are selected for polymerization with the alicyclic moiety-containing monomer on the basis of the ability of the monomer to copolymerize by free radical polymerization. Although the polymers are contemplated as useful in resist materials that are sensitive to radiation in the ultraviolet, and x-ray wavelengths as well as sensitive to electron beam radiation, the polymers are particularly advantageous for use in process in which the exposing radiation is 193 nm, because the amount of ethylenic unsaturation in these resist materials is low.

Energy-sensitive resist material and a process for device fabrication using an energy-sensitive resist material

A lithographic printing plate precursor includes an image-recording layer and a protective layer containing a stratiform compound, wherein at least one of the image-recording layer and the protective layer contains a polymer containing as a repeating unit, a structural unit having an ammonium structure.

Lithographic printing plate precursor and lithographic printing method

Mixtures which are curable by heating or irradiation with actinic light contain one or more cationically curable compounds, such as an epoxy, an olefinically unsaturated monomer, amino resin or phenolic resin, and as a cationically active curing catalyst one or more N-sulfonylamino-sulfonium salts of the formula ##STR1## such as N-p-toluenesulfonyl-N-methylaminodiphenylsulfonium hexafluorophosphate with or without quinones or peroxides are suitable, inter alia, for producing moldings, coatings, relief images and resist patterns.

Curable compositions containing n-sulfonylaminosulfonium salts as cationically active catalysts

4-Acylbenzylsulphonium salts of the formula I in which n = 0 or 1, m = 1 or 2, and m + n = 2 and X is a non-nucleophilic anion, can be prepared by reacting readily accessible p-acylbenzylsulphonium halides with a salt A X = a proton, ammonium cation or cation from main group 1) in solvents. They are advantageous photoinitiators for cationically curable mixtures and photocurable recording materials, in particular for the production of relief images and resist patterns.

4-Acylbenzylsulphonium salts, their preparation, and photocurable mixtures and recording materials containing these compounds

Water-soluble, hydrophobically associating copolymers which comprise new types of hydrophobically associating monomers. The monomers comprise an ethylenically unsaturated group and a polyether group with block structure comprising a hydrophilic polyalkylene oxide block which consists essentially of ethylene oxide groups, and a terminal, hydrophobic polyalkylene oxide block which consists of alkylene oxides with at least 4, preferably at least 5 carbon atoms.

Hydrophobically associating copolymers

A photochromic system contains an oxidizable leuco dye and a photochemically activated initiator which converts the leuco dye to the dye, the initiator being a phenanthroimidazole derivative. The photochromic system is useful for the production of photochromic layers for photoresists and printing plates.

Photochromic system and layers produced therewith

Relief images or resist images are produced by a positive-working process, using a solid photosensitive resist layer which is applied to a base and contains a compound possessing two or more aromatic and/or heteroaromatic o-nitrocarbinol ester groups and crosslinking compounds possessing two or more reactive groups which are capable, under the action of heat, of reacting with carboxyl groups to form a covalent chemical bond. To produce the relief images or resist images, the photosensitive resist layer is first exposed imagewise to actinic light, the exposed areas of this layer are then washed out with an aqueous developer, the remaining resist layer is post-exposed uniformly to actinic light and finally the post-exposed resist layer is thermally crosslinked and hardened.

Reinhold J. Leyrer

Papers

Curable compositions containing n-sulfonylaminosulfonium salts as cationically active catalysts

4-Acylbenzylsulphonium salts, their preparation, and photocurable mixtures and recording materials containing these compounds

Hydrophobically associating copolymers

Photochromic system and layers produced therewith

Production of relief images or resist images by a negative-working method