Germanium nanowires with p- and n-dopants were synthesized by chemical vapor deposition and used to construct complementary field effect transistors . Electrical transport and x-ray photoelectron spectroscopy data are correlated to glean the effects of Ge surface chemistry to the electrical characteristics of GeNWs. Large hysteresis due to water molecules strongly bound to GeO2 on GeNWs is revealed. Different oxidation behavior and hysteresis characteristics and opposite band bending due to Fermi level pinning by interface states between Ge and surface oxides are observed for p- and n-type GeNWs. Vacuum annealing above 400C is used to remove surface oxides and eliminate hysteresis in GeNW FETs. High-k dielectric HfO2 films grown on clean GeNW surfaces by atomic layer deposition (ALD) using an alkylamide precursor is effective serving as the first layer of surface passivation. Lastly, the depletion length along the radial direction of nanowires is evaluated. The result suggests that surface effects could be dominant over the bulk properties of small diameter wires.

https://arxiv.org/pdf/cond-mat/0407186.pdf

Surface Chemistry and Electrical Properties of Germanium Nanowires

A critical review on the recent studies on plant biomaterials as corrosion inhibitors for industrial metals

Evaluation of Ficus tikoua leaves extract as an eco-friendly corrosion inhibitor for carbon steel in HCl media.

Experimental and theoretical studies of the synergistic inhibition effects between the plant leaves extract (PLE) and zinc salt (ZS) in corrosion control of carbon steel in chloride solution

https://iopscience.iop.org/article/10.1149/2.0581610jes/pdf

A Gold Micro-Reference Electrode for Impedance and Potential Measurements in Lithium Ion Batteries

Preparation of chalcogenide thin films using electrodeposition method for solar cell applications – A review

Copper corrosion by the action of aerobic A. sulfureus in neutral medium was investigated. The bacteria form biofilm and colonize on the copper metal surface resulting in corrosion leading to blue green colour water. A. indica (neem) leaf extract was found to be effective in inhibiting the growth of the bacteria and thus help in preventing the corrosion. The copper coupons immersed for different durations in media with and without neem leaf extract were tested for their weight loss to study the corrosion rate. The copper biocorrosion was also investigated using electrochemical impedance spectroscopy and potentiodynamic polarization studies. The morphology of the films formed on the metal surface in different media at different immersion times were studied using scanning electron microscopy.

Azadirachta indica leaves extract as inhibitor for microbial corrosion of copper by Arthrobacter sulfureus in neutral pH conditions—A remedy to blue green water problem

Effect of potential drifts and ac amplitude on the electrochemical impedance spectra

Ru chemical mechanical planarization CMP was studied in slurries containing titania and potassium bromate at different pHvalues, showing that the Ru removal rate is enhanced at pH 2 or less. Potentiodynamic polarization studies indicate that thecorrosion current is enhanced in the presence of bromate, while the static etch rate experiments show that the etch rate is low.Potassium bromate increases Ru removal only at anodic potentials or during mechanical abrasion. Studies at different concentra-tions of abrasive and oxidizing agent reveal that the removal rate enhancement saturates at 0.75 mM bromate and 4 wt % titania.© 2010 The Electrochemical Society. DOI: 10.1149/1.3481948 All rights reserved.Manuscript submitted July 6, 2010; revised manuscript received July 27, 2010. Published August 31, 2010.

http://www.che.iitm.ac.in/~srinivar/PrePrint/RuBromate.Noyel.2010.pdf

Potassium Bromate as an Oxidizing Agent in a Titania-Based Ru CMP Slurry

Potassium peroxymonosulfate (Oxone) was investigated as an oxidizing agent in silica based slurries for chemical mechanical planarization of Ru. Upon addition of oxone, the Ru removal rate increases significantly in the pH range of 1‐6. The slurry stability is poor at pH 3 and higher. At pH 2, oxone enhances the Ru removal rate even in the absence of abrasive, indicating that a soft film is formed on the Ru surface. Ru dissolution experiments show that the static etch rate is low. The Ru removal rate variation with pressure and velocity does not follow the Preston equation.

http://esl.ecsdl.org/content/15/3/H55.full.pdf

S. Noyel Victoria

Papers

Preparation of chalcogenide thin films using electrodeposition method for solar cell applications – A review

Azadirachta indica leaves extract as inhibitor for microbial corrosion of copper by Arthrobacter sulfureus in neutral pH conditions—A remedy to blue green water problem

Effect of potential drifts and ac amplitude on the electrochemical impedance spectra

Potassium Bromate as an Oxidizing Agent in a Titania-Based Ru CMP Slurry

Chemical Mechanical Planarization of Ruthenium with Oxone as Oxidizer