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Şadan Korkmaz

Researcher at Eskişehir Osmangazi University

Publications -  108
Citations -  1306

Şadan Korkmaz is an academic researcher from Eskişehir Osmangazi University. The author has contributed to research in topics: Thin film & Vacuum arc. The author has an hindex of 17, co-authored 106 publications receiving 1087 citations.

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Some physical properties of ZnO thin films prepared by RF sputtering technique

TL;DR: In this article, ZnO thin films were deposited with RF sputtering using pure Zn target, in order to generate oxidation process of Zn, Ar:O 2 gas mixing in (9:1), (7:3) and (5:5) ratios of Ar: O 2 was used.
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Optical and Surface Characteristics of Mg-Doped GaAs Nanocrystalline Thin Film Deposited by Thermionic Vacuum Arc Technique

TL;DR: In this article, the microstructure and surface and optical properties of the deposited sample were investigated by x-ray diffraction analysis, scanning electron microscopy, energy-dispersive xray spectroscopy, atomic force microscopy and ultraviolet-visible spectrophotometry.
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ZnO thin film synthesis by reactive radio frequency magnetron sputtering

TL;DR: In this paper, ZnO thin films were deposited on glass substrates by reactive RF magnetron sputtering method at argon-oxygen gas mixing (1:1) atmosphere.
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Morphology, composition, structure and optical properties of CuO/Cu2O thin films prepared by RF sputtering method

TL;DR: In this paper, copper oxide (CuO/Cu2O) nanocrystalline thin films were deposited by radio frequency (RF) magnetron sputtering system at 75 and 100 W. The surface, optical, composition and structural properties of obtaining samples were characterized by using atomic force microscopy (AFM), UV-Vis spectrophotometer, field emission scanning electron microscopy and X-ray diffraction (XRD).
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The Al doping effect on the surface, optical, electrical and nanomechanical properties of the ZnO and AZO thin films prepared by RF sputtering technique

TL;DR: In this article, the structural, surface, optical, electrical and nanomechanical properties of ZnO and aluminum-doped Znoxide (AZO) thin films were determined using X-ray diffraction (XRD), atomic force microscopy (AFM), nanoindentation technique and UV-Vis spectrophotometer.