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Saeed Mahmud Ullah

Researcher at University of Dhaka

Publications -  51
Citations -  312

Saeed Mahmud Ullah is an academic researcher from University of Dhaka. The author has contributed to research in topics: Medicine & Internal medicine. The author has an hindex of 7, co-authored 30 publications receiving 194 citations. Previous affiliations of Saeed Mahmud Ullah include Tokyo Institute of Technology.

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Effect of Different HTM Layers and Electrical Parameters on ZnO Nanorod-Based Lead-Free Perovskite Solar Cell for High-Efficiency Performance

TL;DR: In this article, an alternative lead-free perovskite solar cell is introduced with the CH3NH3SnI3 absorber layer, ZnO nanorod ETM layer, and Cu2O HTM layer.
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Improvement of efficiency of Dye Sensitized Solar Cells by optimizing the combination ratio of Natural Red and Yellow dyes

TL;DR: In this paper, a dye-sensitized solar cells (DSSCs) based on the combination of red (Red spinach) and yellow (Turmeric) natural dyes used as sensitizers for semiconductor TiO2 as electron conductor was investigated.
Journal Article

Simulation and Performance Study of Nanowire CdS/CdTe Solar Cell

TL;DR: In this article, the authors have done modeling and simulation of thin-film CdS/CdTe solar cells and then used nanowire cdS nanowires for using as window layer.
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Hantavirus: The Next Pandemic We Are Waiting For?

TL;DR: Wang et al. as discussed by the authors focused on the biology, pathogenesis, immunology, epidemiology and future perspective of the Hantaviruses, and provided a data-sharing platform where all the researchers should share and make available all the necessary information such as genomics, proteomics, host-factors, and other epigenetics information, which will encourage the research collaboration in the preparation against the hantavirus.
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DFB Lasers With Deeply Etched Vertical Grating Based on InAs–InP Quantum-Dash Structures

TL;DR: In this article, a distributed feedback laser with first-order vertical grating based on AlInGaAs-InAsInP quantum-dash was fabricated by electron beam lithography and Cl2-Ar reactive ion etching with an electron cyclotron resonance source.