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Sarah Griesse-Nascimento

Researcher at Harvard University

Publications -  11
Citations -  126

Sarah Griesse-Nascimento is an academic researcher from Harvard University. The author has contributed to research in topics: Photonics & Nonlinear optics. The author has an hindex of 5, co-authored 11 publications receiving 106 citations.

Papers
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Journal ArticleDOI

Polycrystalline anatase titanium dioxide microring resonators with negative thermo-optic coefficient

TL;DR: In this article, the authors fabricate polycrystalline anatase TiO2 microring resonators with loaded quality factors as high as 25,000 and average losses of 0.58 dB/mm in the telecommunications band.
Journal ArticleDOI

Multimode phase-matched third-harmonic generation in sub-micrometer-wide anatase TiO_2 waveguides

TL;DR: Using sub-micrometer-wide polycrystalline anatase TiO₂ waveguides, third-harmonic generation on a CMOS-compatible platform is demonstrated and higher conversion efficiencies are correlated with phase-matching between the fundamental pump mode and higher-order signal modes.
Journal ArticleDOI

Efficient photon triplet generation in integrated nanophotonic waveguides.

TL;DR: The use of integrated nanophotonics to enhance nonlinear interactions and protocols to design multimode waveguides that enable sustained phase-matching for third-order spontaneous parametric down-conversion (TOSPDC) are developed.
Patent

Direct Entangled Triplet-Photon Sources And Methods For Their Design And Fabrication

TL;DR: In this paper, the present teachings are generally directed to devices and methods for triplet photons generations, and in particular to on-chip integrated sources for generating direct triplet entangled photons.
Journal ArticleDOI

Controlling the Roughness of Langmuir-Blodgett Monolayers.

TL;DR: This work combines conventional Langmuir phase analysis with a novel dynamic viscoelasticity measurement to simply and accurately observe the jamming transition of monolayers of silica spheres, graphene oxide, and surfactant and shows how overcompressing beyond this point can modify the surface roughness of deposited films.