A review of the multi-component utilisation of coal fly ash

Factors influencing bioleaching copper from waste printed circuit boards by Acidithiobacillus ferrooxidans

High density silanization of nano-silica particles using γ-aminopropyltriethoxysilane (APTES)

Nanoscale organic films are important for many applications. We report on a system of molecular layer deposition that allows for the deposition of conformal organic films with thickness and composition control at the subnanometer length scale. Nanoscale polyurea films are grown on silica substrates in a layer-by-layer fashion by dosing 1,4-phenylene diisocyanate (PDIC) and ethylenediamine (ED) in the gas phase. Ellipsometry measurements indicate that the film growth occurs at a constant growth rate, with film thicknesses consistent with molecular distances calculated using density functional theory. Characterization of the films by Fourier transform infrared spectroscopy and X-ray photoelectron spectroscopy reveals formation of stable polyurea films with nearly stoichiometric composition, and transmission electron microscopy indicates that the films uniformly coat the substrate surface. Subnanometer control over the film composition was demonstrated using 2,2'-thiobis(ethylamine) (TBEA) as an alternate diamine to vary the composition of the films. By substituting TBEA for ED, blended films, with homogeneous composition through the film, and nanolaminates, with discrete layers of differing film chemistry, were created.

Formation of organic nanoscale laminates and blends by molecular layer deposition.

https://www.ctcms.nist.gov/%7Edavydov/12Williams_SiC%20bio-functionalization_ApplSS_258.pdf

Immobilization of streptavidin on 4H-SiC for biosensor development

A dense and uniform metal layer was completely coated on the surface of fly-ash cenosphere particles by either electroless plating or magnetron sputtering technique. The surface morphology and characteristics of the electroless and sputtered metal coatings have been compared and investigated by various characterization methods, including scanning electron microscopy, energy dispersion x-ray spectrum, x-ray photoelectron spectroscopy, optical microscopy and atomic force microscopy. The results indicate that the electroless plating process has a faster deposition rate as compared with the sputtering process, and the metal coating fabricated by electroless plating is rough as compared with the metal coating fabricated by magnetron sputtering. The Cu-coated fine cenospheres could be fabricated by the electroless plating technique.

http://iopscience.iop.org/article/10.1088/0022-3727/40/19/038/pdf

A comparison of two methods for metallizing fly-ash cenosphere particles: electroless plating and magnetron sputtering

The surface topography and character of the deposited films formed from ?-aminopropyltriethoxysilane (KH-550) and dodecyltrimethoxysilane (WD-10) on a silicon dioxide substrate (0001) via vapour phase deposition was investigated using atomic force microscopy (AFM), x-ray photoelectron spectroscopy and static water contact angle measurement techniques. The surface topography of the silane films adsorbed on the silicon dioxide substrates is dissimilar with different silane coupling agents and different deposition conditions. The silane films adsorbed on the silicon dioxide substrate become rougher with the increasing time of the deposition, but become smoother with the increasing temperature of the silicon dioxide substrate. The character of the substrate surface was changed from a hydrophilic one to a hydrophobic one after KH-550 or WD-10 deposition, and the WD-10 treated silicon dioxide substrate has a larger contact angle (96.3?) than KH-550 treated substrate (78.7?) at the same deposition condition, which indicates that the WD-10 treated substrate is more hydrophobic than the KH-550 treated substrate.

https://iopscience.iop.org/article/10.1088/0022-3727/39/22/013/pdf

Surface topography and character of γ-aminopropyltriethoxysilane and dodecyltrimethoxysilane films adsorbed on the silicon dioxide substrate via vapour phase deposition

A new particle design method was proposed for the production of hydrophobic corn starch with high flowability by surface modification. The flowability and hydrophobicity of the native and modified corn starches were investigated by wettability (activation index) and flowability experiments (flow time), scanning electron microscopy (SEM), and X-ray diffraction (XRD). In corn starch modification, the optimal modifying agent is a mixture of tetraisopropyldi(dioctylphosphate)titanate (NDZ-401) and methyl hydrogen silicone oil (H202), and the optimal content is 1 % (w/w). The optimal content of flow agent (R972 silica) is 1 % (w/w). The results indicate that the modified corn starch is a free flowing powder, which is also remarkably water repellent. The crystalline structures of the native and modified corn starches are similar, and only the surface properties are changed from hydrophilic to hydrophobic.

Shen Zhigang

Papers

A comparison of two methods for metallizing fly-ash cenosphere particles: electroless plating and magnetron sputtering

Surface topography and character of γ-aminopropyltriethoxysilane and dodecyltrimethoxysilane films adsorbed on the silicon dioxide substrate via vapour phase deposition

Synthesis of Hydrophobic Corn Starch with High Flowability by Surface Modification

Application of graphene on improving atomic oxygen resistance of material

Experimental investigations of improving AO-resistant characteristics of glass fiber/epoxy resin composite filled with superfine cenospheres