S
Shinichi Ito
Researcher at Toshiba
Publications - 254
Citations - 1959
Shinichi Ito is an academic researcher from Toshiba. The author has contributed to research in topics: Substrate (printing) & Resist. The author has an hindex of 22, co-authored 254 publications receiving 1956 citations. Previous affiliations of Shinichi Ito include Nikon & Hitachi.
Papers
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Proceedings ArticleDOI
Subquarter-micron lithography with dual-trench-type alternating PSM
Hideki Kanai,Kenji Kawano,Satoshi Tanaka,Eishi Shiobara,Masami Aoki,Ikuo Yoneda,Shinichi Ito +6 more
TL;DR: In this article, Li et al. evaluated the structural characteristics of a dual-trench type alternating phase shifting mask (PSM), whose shifters are made of perpendicular trenches with different depths alternately, numerically and experimentally.
Patent
Processing method, manufacturing method of semiconductor device, and processing apparatus
TL;DR: In this article, a processing method for selectively reducing or removing the region to be exposed with energy ray in a film formed on a substrate, comprising relatively scanning a first exposure light whose shape on the substrate is smaller than the whole first region, is presented.
Patent
Substrate processing apparatus and processing method by use of the apparatus
TL;DR: An apparatus for processing a substrate comprising a substrate holding mechanism for holding the substrate substantially horizontally, a chemical solution discharge/suction mechanism having a chemical output for discharging the chemical solution onto the substrate and chemical solution inlets for sucking up the chemical solutions present on the substrate as mentioned in this paper.
Patent
Pattern forming method and method of manufacturing semiconductor device
Daisuke Kawamura,Shinichi Ito +1 more
TL;DR: In this paper, a pattern forming method is described, which includes forming a resist film on a substrate, coating the resist film with a coating solution which forms a cover film on the resist surface, removing the cover film after the formation of the latent image, and performing predetermined processing when the defect is found in the first inspection.
Patent
Production of mask for exposure and apparatus for production therefor
TL;DR: In this paper, a SiN phase shift film is formed on a transparent substrate made of quartz and then the reforming and stabilizing treatment of the phase shift mask is executed by oxidizing the mask in an ozone atmosphere without exposure of the mask to the atm. and further, uniformly irradiating the film with far UV rays by a low-pressure mercury lamp, by which the optical constant of the Phase Shift film 502 is adjusted to a desired phase difference and transmittance in the process for producing the mask for exposure.