Sk. Maidul Haque

TL;DR: In this article, Fe doped ZnO thin films with varying Fe doping concentrations have been deposited by rf magnetron sputtering technique on c-Si substrates and X-ray Diffraction (XRD) measurements show the pure wurtzite structure of all the samples.

TL;DR: In this paper, microstructural, physical, and optical properties of two sets of hafnium oxide thin films deposited by radio frequency (RF) magnetron reactive sputtering under a mixed ambient of argon and oxygen have been investigated: one set at various oxygen partial pressure and with substrate bias by 50 W pulse direct current (DC) and another set at similar gaseous ambient as above but without any substrate bias.

TL;DR: In this article, a set of r.f. sputter deposited ZnO thin films prepared with different Mn doping concentrations have been characterised by Extended X-ray Absorption Fine Structure (EXAFS) and X-rays Near Edge Spectroscopy (XANES) measurements at Zn, Mn and O K edges and at Mn L2,3 edges.

TL;DR: In this paper, Mn and Co doped TiO2 thin films are prepared by rf magnetron sputtering technique and GIXRD measurements shows anatase phase for pure TiO 2 and Mn dopedTiO2, however mixed anatase and rutile phase for Co dopTiO 2, which is attributed to the oxygen vacancy mediated interaction between the TM ions.