In a typical reflection ellipsometry experiment, one characterizes the polarization state change that a polarized light beam undergoes upon reflection from a specular surface. This measurement provides ρ≡rp/rs, where rp and rs are the complex amplitude reflection coefficients of the surface for p‐ and s‐polarized waves. Nearly 15 years have passed since the development of automatic ellipsometers along with the detailed calibration, error analysis, and data reduction procedures to be used with them. More specifically, these powerful instruments permit (1) determination of bulk dielectric functions and nondestructive depth profiling of static multilayered materials through measurements as a function of photon energy and (2) characterization of dynamic surfaces in adverse environments through measurements as a function of time at fixed photon energy. In the 15 intervening years, the major research thrusts in ellipsometry have been the exploitation of these instruments in materials and process characterizatio...

Automatic rotating element ellipsometers: Calibration, operation, and real‐time applications

An optical measurement system for evaluating a reference sample that has at least a partially known composition. The optical measurement system includes a reference ellipsometer and at least one non-contact optical measurement device. The reference ellipsometer includes a light generator, an analyzer and a detector. The light generator generates a beam of quasi-monochromatic light having a known wavelength and a known polarization for interacting with the reference sample. The beam is directed at a non-normal angle of incidence relative to the reference sample to interact with the reference sample. The analyzer creates interference between the S and P polarized components in the light beam after the light beam has interacted with reference sample. The detector measures the intensity of the light beam after it has passed through the analyzer. A processor determines the polarization state of the light beam entering the analyzer from the intensity measured by the detector, and determines an optical property of the reference sample based upon the determined polarization state, the known wavelength of light from the light generator and the composition of the reference sample. The processor also operates the optical measurement device to measure an optical parameter of the reference sample. The processor calibrates the optical measurement device by comparing the measured optical parameter from the optical measurement device to the determined optical property from the reference ellipsometer.

Thin film optical measurement system and method with calibrating ellipsometer

An optical measurement system is disclosed for evaluating samples with multi-layer thin film stacks. The optical measurement system includes a reference ellipsometer and one or more non-contact optical measurement devices. The reference ellipsometer is used to calibrate the other optical measurement devices. Once calibration is completed, the system can be used to analyze multi-layer thin film stacks. In particular, the reference ellipsometer provides a measurement which can be used to determine the total optical thickness of the stack. Using that information coupled with the measurements made by the other optical measurement devices, more accurate information about individual layers can be obtained.

Apparatus for analyzing multi-layer thin film stacks on semiconductors

Regression calibration method for rotating element ellipsometers

A sample system investigation system, such as an ellipsometer or polarimeter system, for use in investigating sample systems with electromagnetic wavelengths in the infrared range, and a calibration method for compensating nonidealities in multi-dimensional system rotated and non-rotated component representing matricies, are disclosed. An essentially achromatic compensator of dual-rhomb construction, which introduces a (3*LAMBDA/4) phase shift, but essentially no deviation in the direction of propagation of a polarized beam of electromagnetic wavelengths caused to pass therethrough, even when said compensator is caused to continuously rotate, is also disclosed.

Infrared ellipsometer/polarimeter system, method of calibration, and use thereof

Systematic errors due to nonlinearity and polarization-dependent sensitivity in the detection system of rotating analyzer ellipsometers are described. Post Fourier analysis procedures for detection and correction of these effects are presented.

Stoyan H. Russev

Papers

Correction for nonlinearity and polarization-dependent sensitivity in the detection system of rotating analyzer ellipsometers.