T
Takashi Sato
Researcher at Siemens
Publications - 6
Citations - 112
Takashi Sato is an academic researcher from Siemens. The author has contributed to research in topics: Off-axis illumination & Angular aperture. The author has an hindex of 4, co-authored 6 publications receiving 112 citations. Previous affiliations of Takashi Sato include Toshiba & Infineon Technologies.
Papers
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Patent
Avoidance of pattern shortening by using off axis illumination with dipole and polarizing apertures
TL;DR: In this paper, an off-axis illumination technique was used to avoid pattern shortening in photolithography processes in the manufacture of semiconductor devices, without resorting to generating a mask with a bias.
Patent
Independently controllable shutters and variable area apertures for off axis illumination
TL;DR: Apertures to vary the size and shape of the aperture area without the need to change the whole aperture plate in off-axis lithography was proposed in this article, where the aperture plate (40) is fitted with simple shutter mechanisms (41-44).
Patent
Avoidance of pattern shortening by using an off axis illumination with twisting dipole and polarizing apertures
TL;DR: In this article, an off-axis illumination technique was used to avoid pattern shortening in photolithography processes in the manufacture of semiconductor devices, without resorting to generating a mask with a bias.
Patent
Lithography process using one or more anti-reflective coating films and fabrication process using the lithography process
Tsukasa Azuma,Takashi Sato +1 more
TL;DR: In this article, the authors describe a fabrication process using the lithography process, which includes a step of forming an antireflective coating film on a substrate, and a radiation sensitive film is selectively exposed.