T
Takashi Tokuda
Researcher at Tokyo Institute of Technology
Publications - 282
Citations - 3711
Takashi Tokuda is an academic researcher from Tokyo Institute of Technology. The author has contributed to research in topics: Image sensor & CMOS. The author has an hindex of 29, co-authored 280 publications receiving 3336 citations. Previous affiliations of Takashi Tokuda include National Presto Industries & Kyoto University.
Papers
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Journal ArticleDOI
A CMOS LSI-Based Flexible Retinal Stimulator for Retinal Prosthesis
Takashi Tokuda,Sachie Sugitani,Ryosuke Asano,Mari Taniyama,Yasuo Terasawa,Akihiro Uehara,Keiichiro Kagawa,Masahiro Nunoshita,Yasuo Tano,Jun Ohta +9 more
TL;DR: To improve current injection capability of the device, IrOx and TiN film electrodes were characterized, and formation of theTiN film electrode on the flexible retinal stimulator was successfully performed.
Proceedings ArticleDOI
A retinal prosthetic device using a pulse-frequency-modulation CMOS image sensor
Jun Ohta,Tetsuo Furumiya,David C. Ng,Akihiro Uehara,Keiichiro Kagawa,Takashi Tokuda,Masahiro Nunoshita +6 more
TL;DR: In this paper, a retinal prosthetic device using a PFM-based photosensor with a standard CMOS technology and its modification to stimulate retinal cells effectively was described.
Implantable CMOS Image Sensor Using Multilayer Filter Emission and Fiber Coupled Laser Excitation
Erus Rustami,Yasumi Ohta,Kiyotaka Sasagawa,Makito Haruta,Toshihiko Noda,Takashi Tokuda,Jun Ohta +6 more
TL;DR: In this article, the authors proposed a new method in combining composite emission filters with fiber coupled laser excitation for lens-free fluorescence imaging applications, which consisted of an interference filter and an absorption filter.
Journal ArticleDOI
Efficient Approach for the Design of Effective Chiral Quaternary Phosphonium Salts in Asymmetric Conjugate Additions.
TL;DR: In this paper, various phosphonium bromide catalysts are presented, one of them proves to be an efficient promoter for asymmetric conjugate additions under base-free phase transfer conditions with low catalyst loading.
Proceedings ArticleDOI
SiGe/Si "Micro-Origami" Epitaxial MEMS Device on SOI Substrate
TL;DR: In this paper, an epitaxial MEMS structure based on strain-induced bending of a SiGe/Si released layer was fabricated and a micromirror device was fabricated.