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Takehito Yoshida

Researcher at Panasonic

Publications -  19
Citations -  297

Takehito Yoshida is an academic researcher from Panasonic. The author has contributed to research in topics: Silicon & Nanoparticle. The author has an hindex of 7, co-authored 19 publications receiving 293 citations.

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Structures and optical properties of silicon nanocrystallites prepared by pulsed-laser ablation in inert background gas

TL;DR: In this paper, a process condition where well-dispersed Si nanocrystallites devoid of droplets and debris are prepared, by varying excitation laser conditions, was extracted, and the influence of the inert background gas pressures on transition from amorphous-like thin films to nanocrystites.
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Size classification of Si nanoparticles formed by pulsed laser ablation in helium background gas

TL;DR: In this article, an integrated process system for the formation of nanoparticles by pulsed laser ablation (PLA) in helium background gas, size classification using a differential mobility analyzer (DMA), and deposition on a substrate was developed.
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Photoacoustic and luminescence spectra of CdS fine particles

TL;DR: In this article, the size effects of the relaxation mechanism of optically excited electrons in CdS fine particles were investigated by means of photoacoustic and luminescence spectroscopies.
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Stoichiometric indium oxide thin films prepared by pulsed laser deposition in pure inert background gas

TL;DR: In this paper, a drastic change in the properties of indium oxide (In2O3) thin films prepared by pulsed laser deposition in a pure helium background gas on unheated glass substrates was observed.
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Monodispersed, nonagglomerated silicon nanocrystallites

TL;DR: In this article, the authors demonstrate the synthesis of monodispersed, nonagglomerated silicon (Si) nanocrystallites using an integrated process system composed of a unit for the formation of nanocrystites by pulsed-laser ablation in an inert background gas, a unit to classify using a differential mobility analyzer (DMA), and an unit for deposition onto a substrate using a nozzle jet.