Showing papers by "Tetsu Tanaka published in 1992"

Fabrication of Fe-N Thin Films by the Plasma Evaporation Method and Analysis of N 2 Plasma

Abstract: The relationships between the formation of iron nitride films by plasma reactive evaporation and the plasma parameters (space potential V s , electron density N e and electron temperature T e ) were investigated. The V s , N e and T e of the reactive nitrogen plasma were determined by the single probe method. The formation of nitrides was found to depend strongly on both V s and N e . The nitrogen concentration increased with increasing N e and V s . In particular, an ?' phase was obtained when Ne=(1 to 3)×109 cm?3 and V s was either 50 V or between 300 and 500 V. The process of nitride formation in the plasma reactive evaporation was also investigated by using evaporated iron films exposed to nitrogen plasma. The nitrides were found to be formed mainly on the film surface.