T
Tetsuji Sato
Researcher at Tokyo Electron
Publications - 1
Citations - 90
Tetsuji Sato is an academic researcher from Tokyo Electron. The author has contributed to research in topics: Etching (microfabrication) & Plasma processing. The author has an hindex of 1, co-authored 1 publications receiving 90 citations.
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Plasma processing method and apparatus
TL;DR: In this paper, a patterned resist film was used as a mask to remove the deposits accumulated inside a processing chamber during the step of etching the target object by using a processing gas containing at least an O 2 gas, and ashing the resist film by using processing gas with at least O 2 2 gas.