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Theodor Weiss

Researcher at University of Bremen

Publications -  5
Citations -  79

Theodor Weiss is an academic researcher from University of Bremen. The author has contributed to research in topics: Thin film & Chemical vapor deposition. The author has an hindex of 4, co-authored 5 publications receiving 71 citations.

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Chemisorbed Oxygen on the Au(321) Surface Alloyed with Silver: A First-Principles Investigation

TL;DR: In this paper, the adsorption of oxygen on kinked Au(321) slabs is investigated theoretically on the basis of density functional theory, and on-surface, subsurface, and surface-oxide forms of O are analyzed and compared on pure gold and on the surfaces containing silver atoms.
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Influence of Water on Chemical Vapor Deposition of Ni and Co thin films from ethanol solutions of acetylacetonate precursors.

TL;DR: In chemical vapor deposition experiments with pulsed spray evaporation (PSE-CVD) of liquid solutions of Ni and Co acetylacetonate in ethanol as precursors, the influence of water in the feedstock on the composition and growth kinetics of depositedNi and Co metal films was systematically studied.
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XPS study of thermal and electron-induced decomposition of Ni and Co acetylacetonate thin films for metal deposition

TL;DR: In this article, the preparation of layers of undecomposed Ni(acac)2 and Co-acac2 was tried via pulsed spray evaporation of a liquid solution of the precursors in ethanol into a flow of nitrogen on a CVD reactor.
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Investigation of the growth behaviour of cobalt thin films from chemical vapour deposition, using directly coupled X-ray photoelectron spectroscopy

TL;DR: In this paper, cobalt thin films were deposited by means of pulsed-spray evaporation chemical vapour deposition (PSE-CVD) from ethanol solutions of Co(acac)2 and Co(ACac)3 on bare glass and silicon substrates.
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Design of a compact ultrahigh vacuum-compatible setup for the analysis of chemical vapor deposition processes.

TL;DR: The present reactor design is versatile to be employed for all commonly employed variants of CVD, including Atomic Layer Deposition, and holds promise for future systematic studies of the fundamental processes during chemical vapor deposition or atomic layer deposition.