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Investigation of the growth behaviour of cobalt thin films from chemical vapour deposition, using directly coupled X-ray photoelectron spectroscopy

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TLDR
In this paper, cobalt thin films were deposited by means of pulsed-spray evaporation chemical vapour deposition (PSE-CVD) from ethanol solutions of Co(acac)2 and Co(ACac)3 on bare glass and silicon substrates.
Abstract
Abstract Thin films and coatings are a basis for many technological processes, including microelectronics, electrochemistry and catalysis. The successful deposition of metal films and nanoparticles by chemical vapour deposition (CVD) needs control over a number of physico-chemical processes such as precursor and substrate selection, delivery, temperature, pressure and flow conditions. Here, cobalt thin films were deposited by means of pulsed-spray evaporation chemical vapour deposition (PSE-CVD) from ethanol solutions of Co(acac)2 and Co(acac)3 on bare glass and silicon substrates. The physico-chemical properties of the grown films were characterised by XRD (X-ray diffraction), XPS (X-ray photoelectron spectroscopy) and HIM (helium ion microscopy). Co(acac)2 enabled the growth of cobalt metal at lower temperatures than Co(acac)3. The difference in deposition temperature was attributed to the ability of ethanol to reduce Co(acac)2 better than Co(acac)3. In addition, the film deposited from Co(acac)2 exhibited a higher metal content and a less porous structure than that deposited from Co(acac)3. Increasing the substrate temperature enhanced the carbon content because of the thermal decomposition of both precursors. Using a nickel seed layer improved the growth rate until a critical temperature of 360 ℃, at which the thermal decomposition of the precursor becomes predominant. A decrease in the deposition temperature when using the nickel seed layer was only observed with Co(acac)2 precursor; the growth behaviour under these conditions was monitored with a unique UHV-compatible PSE-CVD reactor directly attached to an XPS system and ascribed to an enhancement of its catalytic reduction by ethanol.

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Journal ArticleDOI

Cu-Promoted Cobalt Oxide Film Catalyst for Efficient Gas Emissions Abatement

TL;DR: In this paper, the authors reported the slight loading of Cu in cobalt spinel using a one-step pulsed-spray evaporation chemical vapor deposition (PSE-CVD) synthesis technique for efficient short chain volatile organic compounds (VOCs) emissions treatment.
Journal ArticleDOI

An efficient and innovative catalytic reactor for VOCs emission control

TL;DR: In this article, a heterogeneous chemical kinetic study of propene oxidation within a newly designed catalytic jet-stirred reactor (CJSR) was conducted, where the CuO thin films have been characterized using density functional theory (DFT) method.
Journal ArticleDOI

A Comparative Sorption Study of Ni (II) form Aqueous Solution Using Silica Gel, Amberlite IR-120 and Sawdust

TL;DR: In this article, the authors compared the sorption study of Ni (II) using silica gel, amberlite IR-120 and sawdust of mulberry wood in batch system under the influence of pH, initial Ni(II) concentration and contact time.
Journal ArticleDOI

Insight into one-step synthesis of active amorphous La-Co thin films for catalytic oxidation of CO

TL;DR: Active amorphous lanthanum-based thin films were synthesized through one-step pulsed spray evaporation chemical vapor deposition (PSE-CVD) technique at 320 °C for CO oxidation as mentioned in this paper.
Journal ArticleDOI

Insights into the role of surface functional species in Cu-Mn-O thin film catalysts for N2O decomposition

TL;DR: In this paper, low-cost catalysts based on copper manganese oxides were synthesized by chemical vapor deposition technique for N2O decomposition, and the obtained catalysts were characterized to identify the structure, morphology, composition and arrangement of formed species.
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