The invention discloses a sapphire polishing process. The sapphire polishing process comprises the following steps: performing raw material pre-treatment, performing accurate grinding, polishing, cleaning, testing and the like. According to the sapphire polishing process, the surface of a raw material is ground through the raw material pre-treatment and accurate grinding processes; the difficulty in polishing is reduced; the polishing time is saved; a polishing solution which is prepared from aluminium oxide is high in hardness, and a chemical reaction is produced in a process of rubbing a sapphire, so that CMP (Chemical Mechanical Polishing) is performed effectively; the stability is high; the cost is low; the stability of the polishing solution is improved through an FA/O compound active agent; the flatness of a polished surface and the work efficiency are improved; through experiments, the removal rate of the polishing is 6 mu m/hr when the pressure value is 4 psi, the rotating speed is 60 rpm, and the pH value is 10; the removal rate of the polishing is 8 mu m/hr when the pressure value is 5 psi, the rotating speed is 60 rpm, and the pH value is 10. The process flow of the sapphire polishing process is simple; meanwhile, the cost is saved; the sapphire polishing process is worth being popularized in the future.

Sapphire polishing process

The invention provides a repair machining method for back defects of 2-inch and 4-inch sapphire substrates The repair machining method for back defects of the 2-inch and 4-inch sapphire substrates comprises the steps that firstly, a wafer bonding and waxing machine is used for bonding the front face of the substrate to a ceramic plate, the ceramic plate is placed in a self-made polishing wheel fixture, and grinding is conducted on the substrate through a double-sided grinding device, wherein the preparation ratio of silicon carbide grinding powder to suspension liquid to deionized water in grinding liquid is 1Kg: 01 L : 1L-5L, the suspension liquid is a mixed solution of sodium nitrite and triethanolamine which are in the mass ratio of 1:9, the speed of a lower disk of the grinding device is set to be 20 r/min, the rotating speed of an upper disk of the grinding device is set to be 15 r/min, the flow of the grinding liquid is set to be 300 mL/min, the pressure is the dead weight of the ceramic plate and is 57 KG, and the machining time is 10 minutes; and debonding, cleaning, annealing and polishing are conducted on the grinded substrate The quality indexes of the repaired sapphire substrates reach the industrial standard, the quality standard of the repaired sapphire substrates meets the demands of a client, scrapping treatment is not needed, the yield is significantly improved, and cost is greatly reduced

Repair machining method for back defects of 2-inch and 4-inch sapphire substrates

The invention provides a compound liquid for glass edge grinding and relates to the field of glass processing. The compound liquid is prepared by mixing the following raw materials in mass ratio: 400 of glycerin, 600 of water and 63 of sodium carboxymethyl cellulose. The compound liquid provided by the invention is used for glass edge grinding; and when the compound liquid is used for manual glass edge grinding, the manual glass edge grinding difficulty can be lowered, the glass edge grinding process is more smooth, flying debris is reduced because the ground debris can be adsorbed, and the glass is prevented from being broken because the glass vibration amplitude in the grinding process can be reduced.

Compound liquid for glass edge grinding

The invention discloses a special grinding fluid for a synthetic sapphire camera lens. The sapphire grinding fluid comprises the following components in percentage by weight: 20-30% of a grinding agent, 10-15% of a suspending agent, 5-10% of a cutting agent, 3-5% of an accelerator and the balance of water; and the pH value of the grinding fluid is 7 to 8. The grinding fluid is evenly dispersed, the grinding agent is suspended stably and is difficultly precipitated at the bottom of a machine in recycling use during grinding process, and a grinding fluid membrane can be better adhered to a grinding disc so as to prevent a wafer from being in direct contact with the grinding disc and causing scratch, so that the grinding efficiency can be improved, the yield of ground products is increased, throwing is difficultly caused due to an overlarge rotating speed, in addition, the removal rate of the grinding fluid is high and the recycling service life is long.

Special grinding fluid for synthetic sapphire camera lens

The invention discloses a silicon-based A-directional sapphire polishing solution and a preparation method thereof. The polishing solution is prepared from the following raw material components in parts by mass: 70-90 parts of silica sol, 5-25 parts of detonation nano-diamond dispersion, 0.1-2 parts of an inorganic electrolyte solution, 0.2-3 parts of an anti-caking agent solution and 0.5-5 partsof a pH buffer solution. The average polishing rate of the polishing solution is higher than 2.5mu m/h and the service life is longer than 7 h when the polishing solution is used for polishing A-directional sapphire for 2 hours, and the problems of low polishing rate, shorter polishing service life, fast loss of auxiliary materials and the like in the current domestic A-directional sapphire polishing solution can be solved.

Silicon-based A-directional sapphire polishing solution and preparation method thereof

The invention relates to the technical field of sapphire grinding and polishing, in particular to a fine grinding solution for sapphire grinding. The fine grinding solution comprises the following components in percentage by weight: 10-15% of superfine high-hardness micro powder, 0.1-1.5% of a dispersing agent, 1-5% of a powder lubricant and the balance of deionized water, wherein the powder lubricant is graphite or hexagonal boron nitride. Through the adoption of the dispersing agent, micro powder can form a stable suspension system, so that flowing and transmission of the micro powder are facilitated, and a sol system has excellent permeation and cleaning functions to take fines generated in the grinding process away in a fluidal manner; aiming at the problem of the short service life, the powder lubricant is added in the fine grinding solution, so that a grinding contact surface has a sliding buffering effect, the powder can roll under the high pressure to prevent the superfine high-hardness micro powder from being in contact with a sapphire crystal surface and damaging a grinding material, and the service life of the fine grinding solution is prolonged; the invention further provides an efficient sapphire fine grinding method.

Tian Duosheng

Papers

Effective sapphire fine grinding method and fine grinding solution