The growing packing density and power consumption of very large scale integration (VLSI) circuits have made thermal effects one of the most important concerns of VLSI designers The increasing variability of key process parameters in nanometer CMOS technologies has resulted in larger impact of the substrate and metal line temperatures on the reliability and performance of the devices and interconnections Recent data shows that more than 50% of all integrated circuit failures are related to thermal issues This paper presents a brief discussion of key sources of power dissipation and their temperature relation in CMOS VLSI circuits, and techniques for full-chip temperature calculation with special attention to its implications on the design of high-performance, low-power VLSI circuits The paper is concluded with an overview of techniques to improve the full-chip thermal integrity by means of off-chip versus on-chip and static versus adaptive methods

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Thermal Modeling, Analysis, and Management in VLSI Circuits: Principles and Methods

Over the past decade, system-on-chip (SoC) designs have evolved to address the ever increasing complexity of applications, fueled by the era of digital convergence. Improvements in process technology have effectively shrunk board-level components so they can be integrated on a single chip. New on-chip communication architectures have been designed to support all inter-component communication in a SoC design. These communication architecture fabrics have a critical impact on the power consumption, performance, cost and design cycle time of modern SoC designs. As application complexity strains the communication backbone of SoC designs, academic and industrial R&D efforts and dollars are increasingly focused on communication architecture design. 

This book is a comprehensive reference on concepts, research and trends in on-chip communication architecture design. It will provide readers with a comprehensive survey, not available elsewhere, of all current standards for on-chip communication architectures.

KEY FEATURES
* A definitive guide to on-chip communication architectures, explaining key concepts, surveying research efforts and predicting future trends
* Detailed analysis of all popular standards for on-chip communication architectures
* Comprehensive survey of all research on communication architectures, covering a wide range of topics relevant to this area, spanning the past several years, and up to date with the most current research efforts
* Future trends that with have a significant impact on research and design of communication architectures over the next several years

On-Chip Communication Architectures: System on Chip Interconnect

As thermal problems become more evident, new physical design paradigms and tools are needed to alleviate them. Incorporating thermal vias into integrated circuits (ICs) is a promising way of mitigating thermal issues by lowering the thermal resistance of the chip itself. However, thermal vias take up valuable routing space, and therefore, algorithms are needed to minimize their usage while placing them in areas where they would make the greatest impact. With the developing technology of three-dimensional integrated circuits (3D ICs), thermal problems are expected to be more prominent, and thermal vias can have a larger impact on them than in traditional 2D ICs. In this paper, thermal vias are assigned to specific areas of a 3D IC and used to adjust their effective thermal conductivities. The thermal via placement method makes iterative adjustments to these thermal conductivities in order to achieve a desired maximum temperature objective. Finite element analysis (FEA) is used in formulating the method and in calculating temperatures quickly during each iteration. As a result, the method efficiently achieves its thermal objective while minimizing the thermal via utilization.

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Thermal via placement in 3D ICs

Heat dissipation is one of the most serious challenges in 3-D IC designs. One effective way of reducing circuit temperature is to introduce thermal through-the-silicon (TTS) vias. In this paper, we extended the TTS-via planning in a multilevel routing framework by Cong and Zhang (2005), but use a much enhanced TTS-via planning algorithm. We formulate the TTS-via minimization problem with temperature constraints as a constrained nonlinear programming problem (NLP) based on the thermal resistive model and develop an efficient heuristic algorithm, named m-ADVP, which solves a sequence of simplified via planning subproblems in alternating direction in a multilevel framework. The vertical via distribution is formulated as a convex programming problem, and the horizontal via planning is based on two efficient techniques: path counting and heat propagation. Experimental results show that the m-ADVP algorithm is more than 200/spl times/ faster than the direct solution to the NPL formulation for via planning with very similar solution quality (within 1% of TS-vias count). However, compared to a recent work of multilevel TS-via planning algorithm based on temperature profiling (Cong and Zhang, 2005), our algorithm can reduce the total TS-via number by over 68% for the same required temperature with similar runtime.

Thermal via planning for 3-D ICs

As thermal problems become more evident, new physical design paradigms and tools are needed to alleviate them. Incorporating thermal vias into integrated circuits (ICs) is a promising way of mitigating thermal issues by lowering the effective-thermal resistance of the chip. However, thermal vias take up valuable routing space, and therefore, algorithms are needed to minimize their usage while placing them in areas where they would make the greatest impact. With the developing technology of three-dimensional integrated circuits (3-D ICs), thermal problems are expected to be more prominent, and thermal vias can have a larger impact on them than in traditional two-dimensional integrated circuits (2-D ICs). In this paper, thermal vias are assigned to specific areas of a 3-D IC and used to adjust their effective-thermal conductivities. The method, which uses finite-element analysis (FEA) to calculate temperatures quickly during each iteration, makes iterative adjustments to these thermal conductivities in order to achieve a desired thermal objective and is general enough to handle a number of different thermal objectives such as achieving a desired maximum operating temperature. With this method, 49% fewer thermal vias are needed to obtain a 47% reduction in the maximum temperatures, and 57% fewer thermal vias are needed to obtain a 68% reduction in the maximum thermal gradients than would be needed using a uniform distribution of thermal vias to obtain these same thermal improvements. Similar results were seen for other thermal objectives, and the method efficiently achieves its thermal objective while minimizing the thermal-via utilization.

http://www.ee.umn.edu/users/sachin/jnl/tcad06bg.pdf

Placement of thermal vias in 3-D ICs using various thermal objectives

This paper presents both compact analytical models and fast SPICE based 3-D electro-thermal simulation methodology to characterize thermal effects due to Joule heating in high performance Cu/low-k interconnects under steady-state and transient stress conditions. The results demonstrate excellent agreement with experimental data and those using Finite Element (FE) thermal simulations (ANSYS). The effect of vias, as additional heat sinking paths to alleviate the temp erature rise in the metal wires, is included in our analysis to provide more accurate and realistic thermal diagnosis. It shows that the effectiveness of vias in reducing the temperature rise in interconnects is highly dependent on the via separation and the dielectric materials used. The analytical model is then applied to estimate the temperature distribution in multi-level interconnects. In addition, we discuss the possibility that, under the impact of thermal effects, the performance improvement expected from the use of low-k dielectric materials may be degraded. Furthermore, thermal coupling between wires is evaluated and found to be significant. Finally, the impact of metal wire aspect ratio on interconnect thermal characteristics is discussed.

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Ting Yen Chiang

Papers

Compact modeling and SPICE-based simulation for electrothermal analysis of multilevel ULSI interconnects