T
Tomi Laurila
Researcher at Aalto University
Publications - 193
Citations - 7345
Tomi Laurila is an academic researcher from Aalto University. The author has contributed to research in topics: Amorphous carbon & Electrode. The author has an hindex of 33, co-authored 176 publications receiving 6357 citations. Previous affiliations of Tomi Laurila include University of Helsinki & Helsinki University of Technology.
Papers
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Proceedings ArticleDOI
Understanding the effect of electromigration on the growth of interfacial reaction layers in Cu-Sn and Cu-Ni-Sn systems
Tomi Laurila,Aloke Paul +1 more
TL;DR: In this paper, the effects of chemical and electrical driving forces on the evolution of interfacial reaction layers in lead-free solder interconnections are discussed, and the results are then used to predict the subsequent changes in the intrinsic fluxes of the elements.
Book ChapterDOI
Thermodynamic-Kinetic Method on Microstructural Evolutions in Electronics
TL;DR: In this article, the combination of thermodynamics and kinetics (namely the thermodynamic-kinetic method) can be used to rationalize the evolution of microstructure between dissimilar materials.
Journal ArticleDOI
Study on the Growth of Nb3Sn Superconductor in Cu(Sn)/Nb Diffusion Couple
TL;DR: In this article, the authors have addressed the confusion over the growth rate of the Nb3Sn phase and discussed a possible explanation for the corrugated layer in the multifilamentary structure.
Book ChapterDOI
Evolution of Different Types of Interfacial Structures
Tomi Laurila,Vesa Vuorinen,Toni T. Mattila,Markus Turunen,Mervi Paulasto-Kröckel,Jorma K. Kivilahti +5 more
TL;DR: The feasibility of the thermodynamic-kinetic method and the associated science of microstructures are demonstrated by going through a large amount of examples concerning interfacial compatibility problems from the various fields of microtechnologies as discussed by the authors.