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Toshio Hattori

Researcher at Gifu University

Publications -  28
Citations -  232

Toshio Hattori is an academic researcher from Gifu University. The author has contributed to research in topics: Fatigue limit & Fretting. The author has an hindex of 8, co-authored 28 publications receiving 197 citations.

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Fretting fatigue strength estimation considering the fretting wear process

TL;DR: In this paper, the authors present the estimation methods of fretting wear process and fretting fatigue life using this wear process, where the wear of contact surfaces near contact edges occur in accordance with the reciprocal micro-slippages on these contact surfaces.
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Fretting fatigue life estimations based on fretting mechanisms

TL;DR: In this article, a new critical distance theory was proposed to estimate the low-cycle fretting fatigue life based on a new Critical Distance Theory for a high-stress region using ultimate tensile strength σ B and fracture toughness K IC.
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Dynamic axial compression of aluminum hollow tubes with hat cross-section and buckling initiator using inertia force during impact

TL;DR: In this paper, the first plastic buckling lobe was demonstrated, where the inertia force in the early stage of impact was exploited, and the method used the solid block attached to the structural wall causing the wall bending force.
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Fretting Fatigue Life Estimations Based on the Critical Distance Stress Theory

TL;DR: In this paper, the critical distance for estimating low cycle fatigue strength was calculated by interpolation of critical distance on fatigue limit (estimated from σw0 and ΔKth) with critical distance of σB and KIC, and the validity of this method is confirmed by the V notch specimens.
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Thermal degradation of chlorosulfonated polyethylene rubber and ethylene propylene diene terpolymer

TL;DR: In this article, the thermal degradation of chlorosulfonated polyethylene rubber (CSM) and ethylene propylene diene terpolymer (EPDM) were studied, and the authors used the Arrhenius equation to confirm the relationship between temperature and exposure time.