Optical lattice filter structures including gains are introduced and analyzed. The photonic realization of the active, adaptive lattice filter is described. The algorithms which map between gains space and filter coefficients space are presented and studied. The sensitivities of filter parameters with respect to gains are derived and calculated. An example which is relevant to adaptive signal processing is also provided.

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Active optical lattice filters

High-precision first-order gratings, 110 nm pitch, for GaAs/AlGaAs LD's were successfully fabricated using EB lithography. The field stitching error of EB lithography caused by height difference between reference marks for calibration and the samples, was reduced to 5 nm by controlling the EB deflection voltage calibrated by the detection of the position of the marks on the samples. We also investigated the effect of field stitching error on lasing characteristics using measurement and calculation. We found that a 20 nm stitching error is sufficiently small for single-mode LD operation.

Fabrication of First-Order Gratings for GaAs/AlGaAs LD's by EB Lithography

Highly integrated, novel architectures for optical filtering can leverage structure, gain and variable delays to provide a multi-use photonic platform. Hardware and software results are presented.

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Holographic lithography with the 2315 A line of a xenon ion laser is used to produce gratings in polymethylmethacrylate. An 1180 A period grating is made and examined with a scanning electron microscope (SEM). This grating period is appropriate for use as a first-order grating with a GaAs distributed feedback laser.

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W. B. Bridges

Papers

Generation of 1180 Å period gratings with a Xe ion laser