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Xianzhong Zeng

Researcher at Lawrence Berkeley National Laboratory

Publications -  11
Citations -  916

Xianzhong Zeng is an academic researcher from Lawrence Berkeley National Laboratory. The author has contributed to research in topics: Laser & Laser ablation. The author has an hindex of 10, co-authored 11 publications receiving 872 citations.

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Experimental investigation of ablation efficiency and plasma expansion during femtosecond and nanosecond laser ablation of silicon

TL;DR: Femtosecond laser (Ti:sapphire, 100fs pulse duration) and nanosecond (Nd:YAG, 3 ns pulse duration, 266nm) ablation at ultraviolet wavelength (266nm) were compared by measuring crater depth as a function of pulse number as mentioned in this paper.
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Nanosecond and femtosecond laser ablation of brass: Particulate and ICPMS measurements

TL;DR: Femtosecond and nanosecond lasers were compared for ablating brass alloys and ICPMS showed enhanced signal intensity and stability using femTosecond compared to nanose Cond laser ablation.
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Plasma diagnostics during laser ablation in a cavity

TL;DR: The formation of a laser-induced plasma in a cavity and the effects of a cavity on the ablation process were investigated in this article, where the same authors used the laser-induced plasmas in the cavity and on a flat surface.
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Time-resolved plasma properties for double pulsed laser-induced breakdown spectroscopy of silicon☆

TL;DR: In this article, a systematic measurement of plasma properties (temperature, electron number density, pressure) was performed during LIBS of silicon with two nanosecond pulsed lasers operating at 1064 nm.
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Laser-induced shockwave propagation from ablation in a cavity

TL;DR: In this article, the propagation of laser-induced shockwaves from ablation inside of cavities was determined from time-resolved shadowgraph images, and the temperature and electron number density of the laserinduced plasma were determined from spectroscopic measurements, compared to those for laser ablation on the flat surface under the same energy and background gas condition.