Patent
Aligner and manufacture of semiconductor element
Masato Muraki,真人 村木 +1 more
Reads0
Chats0
TLDR
In this article, a phase shift mask (reticle) applied by a phase shifting method and imparting a predetermined phase difference is used to obtain an aligner and a method for manufacturing a semiconductor element in which a pattern image of high resolution is obtained by maintaining environmental conditions desirably when a pattern is exposed on a wafer surface by using a phase shifter.Abstract:
PURPOSE:To obtain an aligner and a method for manufacturing a semiconductor element in which a pattern image of high resolution is obtained by maintaining environmental conditions desirably when a pattern is exposed on a wafer surface by using a phase shift mask (reticle) applied by a phase shifting method and imparting a predetermined phase difference. CONSTITUTION:A aligner exposes a phase shift mask 2 provided with a phase shift film 22 for imparting a predetermined phase difference to a passed luminous flux to part of a transparent part of a pattern having the transparent part and an opaque part to an object 6 to be exposed, and comprises control means 8 for controlling environmental conditions in an atmosphere of the mask.read more
Citations
More filters
Patent
Alloying element-saving hot rolled duplex stainless steel material, clad steel sheet having duplex stainless steel as mating material therefor, and production method for same
Abstract: This alloying element-saving hot rolled duplex stainless steel material contains, by mass %, C: 0.03% or less, Si: 0.05% to 1.0%, Mn: 0.5% to 7.0%, P: 0.05% or less, S: 0.010% or less, Ni: 0.1% to 5.0%, Cr: 18.0% to 25.0%, N: 0.05% to 0.30% and Al: 0.001% to 0.05%, with a remainder being Fe and inevitable impurities, wherein the alloying element-saving hot rolled duplex stainless steel material is produced by hot rolling, a chromium nitride precipitation temperature TN is in a range of 960° C. or lower, a yield strength is 50 MPa or more higher than that of a hot rolled steel material which is subjected to a solution heat treatment, and the alloying element-saving hot rolled duplex stainless steel material is as hot rolled state, and is not subjected to a solution heat treatment. This clad steel plate includes a duplex stainless steel as a cladding material, the duplex stainless steel has the above composition, and the chromium nitride precipitation temperature TN is in a range of 800° C. to 970° C.
Patent
Exposure device, method of manufacturing device using the exposure device, and gas supply device
Naoki Yamaguchi,Matsumura Yuhei +1 more
TL;DR: In this article, an exposure device is provided to suppress dew condensation due to excessive humidifying capacity of a humidifier, and also suppress a control failure due to insufficient humidifier capacity.
Patent
Clad steel plate having duplex stainless steel as cladding material therefor, and production method for same
TL;DR: A clad steel plate comprising of a base metal and a cladding material joined to either or both of two main surfaces of the steel plate of the base metal by hot rolling is described in this article.
Patent
Alloying element-saving hot rolled duplex stainless steel material, and production method for same
TL;DR: In this paper, an alloying element-saving hot-rolled duplex stainless steel material containing, by mass: C: 0.03% or less; Si: 0,05% to 1.0%; Mn: 0., 0.5% to 7.0%.