A deposition process comprising emitting a beam of particles consisting of atoms and ions of source material, each particle having a kinetic energy between about 10 and 100 electron volts. The particles are deposited onto an object to coat the object with a thin film of source material. A beam gun is provided having an anode and a cathode and is supplied with current of such magnitude as to cause an arc discharge to occur between the anode and cathode to emit the beam.

Abrasive particles comprising a core of alumina-based mineral coated by cathodic arc deposition with a metal boride, carbide, or nitride refractory material are provided. The core can be fused alumina or an alumina-based ceramic. Improved abrasive products having at least a portion of their conventional abrasive particles replaced with the coated abrasive particles are also provided.

Arc deposition apparatus

Method of coating alumina particles with refractory material, abrasive particles made by the method and abrasive products containing the same

The present invention provides a plasma enhancement method and apparatus for electric arc vapor deposition. The plasma enhancement apparatus is positioned to act upon plasma generated from a plasma source before the plasma reaches a substrate to be coated by the plasma. The plasma enhancement apparatus includes a magnet disposed about a magnet axis and defining a first aperture, and a core member disposed about a core member axis and at least partially nested within the first aperture. The core member defines a second aperture, and the plasma enhancement apparatus is arranged and configured in such a manner that the evaporated cathode source material passes from the cathode source and through the second aperture toward the substrate to be coated by the evaporated cathode source material. The plasma is favorably conditioned as it passes through the plasma enhancement apparatus.

Plasma enhancement apparatus and method for physical vapor deposition

A machine for covering a substrate (FIG. 14, 540) by means of both cathodic arc plasma deposition (CAPD) (FIG. 2) and magnetron sputtering (FIG. 1) without breaking vacuum in a single chamber (FIG. 14, 421). A computer system monitors (FIG. 3, 403, 405) and controls all coating process parameters to coat in any sequence multiple thin film layers using either the CAPD or magnetron sputtering process. A rotating substrate table (FIG. 14, 470) used in conjunction with internal and external targets coats both sides of the substrate simultaneously.

Physical vapor deposition dual coating process

The present invention provides a method for producing a diamond-like carbon coating. The method comprises the steps of providing a substrate to be coated, providing a cathode of vitreous carbon or a pyrolytic graphite cathode and initiating a cathodic arc discharge with the arc spot on the cathode surface and directing the resulting carbon plasma toward the substrate to form a coating on said substrate, said coating being substantially macroparticle free.

Method for forming macroparticle-free DLC films by cathodic arc discharge

A rectangular vacuum-arc plasma source and associated apparatus for generating and directing a stream of plasma containing an iozized vapor of a cathode material (30) toward a substrate (44) by vacuum arc evaporation of a rectangular planar cathode (32) mounted in a rectangular plasma duct (34). The rectangular duct (34) conducts the plasma from the cathode (31) to the substrate region (44), while intercepting the molten droplets of cathode material (30) also generated by the arc. Magnets (46, 48, 40) control the arc motion on the cathode surface (33) while simultaneously generating the magnetic field which guides the plasma through the duct (34). Benefits of a filtered cathodic arc (fully ionized vapor stream, elimination of splattered droplets) are combined with the benefits of a rectangular source (uniform evaporation from the source and uniform deposition on the substrate using linear motion). The rectangular source may be extended indefinitely in length, thus allowing coating or ion implantation on large or long substrates.

Arc deposition apparatus

Citations

Method of coating alumina particles with refractory material, abrasive particles made by the method and abrasive products containing the same

Plasma enhancement apparatus and method for physical vapor deposition

Physical vapor deposition dual coating process

Method for forming macroparticle-free DLC films by cathodic arc discharge

Rectangular vacuum-arc plasma source

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