Patent
Arm for wafer transportation for manufacturing semiconductor
Naruaki Iida,Hideki Kajiwara +1 more
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The article was published on 2012-03-02. It has received 116 citations till now. The article focuses on the topics: Wafer.read more
Citations
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Process feed management for semiconductor substrate processing
Fred Pettinger,Carl White,Dave Marquardt,Sokol Ibrani,Eric Shero,Todd Dunn,Kyle Fondurulia,Mike Halpin +7 more
TL;DR: In this paper, a gas channel plate for a semiconductor process module is described, which includes a heat exchange surface including a plurality of heat exchange structures separated from one another by intervening gaps.
Patent
Systems and methods for thin-film deposition of metal oxides using excited nitrogen-oxygen species
TL;DR: In this paper, a process and system for depositing a thin film onto a substrate using atomic layer deposition (ALD) is described. But it is not shown how to apply ALD to a metal oxide layer.
Patent
Semiconductor reaction chamber showerhead
TL;DR: In this paper, a body having an opening, a first plate positioned within the opening and having a plurality of slots, a second plate positioned inside the opening, and having the same number of slots.
Patent
Semiconductor processing reactor and components thereof
TL;DR: In this article, the authors describe a gas delivery system that includes a plurality of gas lines for providing at least one process gas to the reaction chamber and a mixer that is configured to diffuse process gases.
Patent
Gas Supply Manifold And Method Of Supplying Gases To Chamber Using Same
Lucian Jdira,Herbert Terhorst,Michael W. Halpin,Carl White,Todd Dunn,Eric Shero,Melvin Verbass,Christopher Wuester,Kyle Fondurulia +8 more
TL;DR: In this paper, a gas inlet system for a wafer processing reactor includes a tubular gas manifold conduit adapted to be connected to a gas-inlet port of the Wafer Processing Reactor.
References
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Processing system and method for chemically treating a substrate
TL;DR: In this paper, a substrate holder is thermally insulated from the chemical treatment chamber, and the substrate is exposed to a gaseous chemistry, without plasma, under controlled conditions including wall temperature, surface temperature and gas pressure.
Patent
Substrate transfer system for semiconductor processing equipment
Ivo Raaijmakers,Loren R. Jacobs,Michael W. Halpin,James A. Alexander,Ken O'neill,Dennis L. Goodwin +5 more
TL;DR: In this paper, a system for facilitating wafer transfer comprises a susceptor unit (150) consisting of an inner susceptor section (152) which rests within an outer susceptor Section (154).
Patent
Wafer inspection apparatus
Yoshinori Hayashi,Hiroyuki Naraidate,Hiroaki Yuda,Atsushi Tanabe,Hiromichi Isogai,Koji Izunome +5 more
TL;DR: A wafer inspection apparatus has a supporting means (10) for rotatably supporting a wafer (W) formed of a disk, a circumferential edge imaging means (40), a notch imaging means for imaging a notch, a notch illumination part (52) for illuminating the notch, and a control means (70) for processing image data imaged by the imaging cameras (40 and 50).
Patent
Endeffectors for handling semiconductor wafers
TL;DR: In this paper, an end effector for handling semiconductor wafers at relatively low temperature is described along with an endeffector with support members that are configured to only contact a wafer at the wafer's edge.
Patent
Intelligent wafer handling system and method
TL;DR: In this paper, a system for handling stiff but flexible discs, particularly semiconductor wafers, is capable of allowing processing on both sides of a wafer by using optical beams.