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Patent

Arrangement for inspecting circuit patterns drawn on a mask

Yasunobu Kawauchi
TLDR
In this article, a mask inspection arrangement is described, including a magnetic disc memory for storing pattern data which has been used for operating a mask drawing apparatus, a data producing device for optically scanning a mask drawn by the mask drawing device and producing measured data indicative thereof, and a data converter for converting the pattern data from memory into a reference data in the form of dot pattern data for blanking an electron beam.
Abstract: 
A mask inspection arrangement is disclosed including a magnetic disc memory for storing pattern data which has been used for operating a mask drawing apparatus, a data producing device for optically scanning a mask drawn by the mask drawing apparatus and producing measured data indicative thereof, a data converter for converting the pattern data from memory into a reference data in the form of dot pattern data for blanking an electron beam in the mask drawing apparatus, and a comparator for comparing the measured data with the reference data and determining a correlation therebetween.

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Citations
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Patent

Method and apparatus for inspecting substrates

David Treves, +2 more
TL;DR: In this article, the authors describe a substrate inspection system that consists of an optics for reflecting a laser beam off of a substrate and a detector for detecting the reflected laser beam, and the integrator integrates the sum of these signals to generate an integral output signal.
Patent

Methods and systems of preparing extended length flexible harnesses

Joseph C. Fjelstad, +3 more
TL;DR: In this paper, a system and methods for the manufacture of flexible printed wiring harnesses of unlimited length three dimensions is described, where in-line raster scanning (e.g., xerography or laser printing) is used to image continuously updated conductor patterns on an uninterrupted (i.e., seamless) web-fed base material, or substrate.
Patent

Method for converting design intent into a neutral-file-format for computer aided design applications

Ashok B. Srikantappa
TL;DR: In this paper, a language is defined to describe design information that is readily available in electronic form, and a neutral-format file generator reads this design information and translates the same into DXF output file, an industry standard neutral-file format, which can be transferred into most CAD systems.
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Bumper system for limiting the mobility of a wheeled device

Albert, +1 more
TL;DR: In this paper, a bumper is an elongated member having a base wall and an elastically resilient wheel engagement wall coupled to the base wall, one of which includes reliefs for aiding the wall to conform to and stop the rolling action of a wheel.
Patent

Adjustable ergonomic keyboard for use with stationary palm and elements thereof

David J. Levenson
TL;DR: An ergonomic keyboard as discussed by the authors can be used with a stationary palm, where the keys are actuated only by motion of the joints in the digits of the digits and the position of the keyboard relative to a user can be adjusted.
References
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Patent

Electron beam exposure system

Eiichi Goto, +3 more
TL;DR: In this article, an electron beam with a cross-section shaped by two aperture plates and a deflector sequentially irradiates pattern areas within a plurality of unit squares on a workpiece in the X and Y directions.
Patent

Machine implemented method for positioning and inspecting an object

Edward Philip Helpert, +1 more
TL;DR: In this paper, an object is placed beneath a light-sensing element such as an optical fiber and the object is then scanned in different directions under computer control, by producing relative movement between it and the light sensing element to ascertain the shapes of a number of these areas, and the position within each such areas of a characteristic point such as the center of gravity or the centre of one particular edge, of each such area.
Patent

Pattern data handling system for an electron beam exposure system

Donald W. Berrian, +1 more
TL;DR: In this paper, a pattern data handling system for an electron beam exposure system was proposed, where figure data conversion is performed simultaneously with irradiation of a workpiece, thereby providing high speed operation.
Patent

Exposure apparatus using electron beams

Yutaka Hidai, +1 more
TL;DR: In this paper, an exposure apparatus using an electron beam includes a first memory for storing pattern data representing various basic patterns, a data processor for reading from the first memory the pattern data necessary to form a pattern to be drawn, a second memory to store data which correspond to the pattern readings from the data processor.
Patent

High speed data interface buffer for digitally controlled electron beam exposure system

Pasquale Anthony Cardenia, +2 more
TL;DR: In this paper, an electron beam exposure system for forming integrated circuit patterns in which pattern data provided by either a control processor or a mass storage device is transferred through a pattern buffer interface which contains a large buffer memory, the reading and writing of which is automatically controlled by read and write logic contained within the interface.