Patent
Chemical etching solution for crystal of iii-v group compound
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TLDR
In this paper, an etching soln is proposed to provide a mirror-finished surface with high reproducibility in etching depth, and the shape of the cross-section of the etched crystal is independent of the crystal orientation.Abstract:
PURPOSE:To provide the titled etching soln contg an alkali dichromate, hydrochloric acid and acetic acid, giving a mirror-finished surface, and having high reproducibility in etching depth CONSTITUTION:This etching soln is an aqueous soln contg an alkali dechromate such as potassium dichromate or sodium dichromate, hydrochloric acid and acetic acid When a crystal of a III-V group compound is etched with the etching soln, the formation of etching pits can be prevented, and a mirror-finished surface can be obtd with high reproducibility in etching depth The shape of the cross-section of the etched crystal is independent of the crystal orientation, so the etching soln can be used well as an etching soln for mesa etchingread more
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