Patent
Disk scanning apparatus for batch ion implanters
Avrum Freytsis,Judy E Sedgewick +1 more
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TLDR
In this article, a mechanical scanning system for a batch ion implanter includes a disk (40) for mounting wafers at sites near its periphery and a disk drive assembly (50) for rotating the disk.Abstract:
A mechanical scanning system for a batch ion implanter includes a disk (40) for mounting wafers (39) at sites (42) near its periphery and a disk drive assembly (50) for rotating the disk (40). The disk (40) and the disk drive assembly (50) are supported in an end station vacuum chamber (30) by a scan arm (44) which extends through a sealed opening (64) in an access door (60). A scan drive assembly (52) attached to the access door (60) scans the scan arm (44) and the disk (40) in an arc-shaped path. Simultaneous rotation and scanning of the disk cause the ion beam (20) to be distributed over the surfaces of the wafers (39) mounted on the disk (40). A pivot drive assembly (54) rotates the scan arm (44) and the disk (40) about a pivot axis (C) between an implant position and a load/unload position. A bellows (102) seals the scan arm (44) to the vacuum chamber (30) while transmitting arc-shaped movement into the vacuum chamber (30). A bellows guide apparatus guides an intermediate portion of the bellows so as to limit lateral distortion caused by pressure differences applied to the bellows in the combination with asymmetrical deflection thereof.read more
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Method and apparatus for controlling a workpiece in a vacuum chamber
TL;DR: In this article, an apparatus used to control a workpiece inside a vacuum chamber is described, where the workpiece is isolated from the atmosphere outside of the vacuum chamber by differentially pumped vacuum seals and an integral air bearing support.
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Systems and methods for ion implantation of semiconductor wafers
TL;DR: A dual mechanical movement scanning system for ion implantation includes a radial scan arm which is mounted at a fixed pivot point external to the system vacuum chamber and penetrates the chamber and supports the wafer paddle or wheel within the chamber as mentioned in this paper.
Patent
Focusing apparatus for uniform application of charged particle beam
TL;DR: In this paper, a double deflection scanning of charged particle beams is performed using a means for introducing variations in the angle of the charged particle beam in combination with the focal or optical properties of a sector magnet.
Patent
Treating workpieces with beams
TL;DR: In this paper, an ion implanter is presented for controlling the treatment of a workpiece by a beam emanating from a source, where translational relative movement in two orthogonal directions between the beam and the workpiece support element, and control of velocity in one (control) direction occurs in response to a detector, mounted behind the support, which periodically samples the beam through a moving slot in the support element.
Patent
Ion implantation with variable implant angle
TL;DR: In this article, a target holder for an ion implantation system is disclosed, where the targets are supported on a disk which is mounted on a motor which spins the disk and makes a reciprocating scanning movement along its axis.
Patent
Ion implantation system
TL;DR: In this paper, a plurality of beam generating units 76, 78, 80 and 82 each produces separated rectangular ion beams for implantation onto a targets 52 and 54 rotatively moving there past.