Patent
Gas transferring device
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TLDR
In this article, the authors proposed a method to generate gas with low noise and at low cost by installing a partitioning wall having a number of minute penetration holes permitting Knudsen diffusion between the high-temperature side and the low-tem temperature side and installing a temperature-difference generating mechanism onto the high or low temperature side.Abstract:
PURPOSE:To generate gas with low noise and at low cost by installing a partitioning wall having a number of minute penetration holes permitting Knudsen diffusion between the high-temperature side and the low-temperature side and installing a temperature-difference generating mechanism onto the high-temperature side and/or low-temperature side. CONSTITUTION:In a gas transferring device, a partitioning wall 2 made of Knudsen substance is installed at a proper place in a gas passage 1, and said partitioning wall 2 has a number of penetration holes which satisfy the following equation: k=lambda/a>1, in which the average free path of a gas particle is A, and the diameter of penetration hole is a. A heater 3 is installed onto the high- temperature side of the partitioning wall 2 and a water cooling pipe 4 is installed onto the low-temperature side, and when a temperature difference over 20 deg.C is provided between the high-temperature side and the low-temperature side of the partitioning wall 2, a large amount of gas is transferred from the high-temperature side to the low-temperature side through minute gas holes (penetration holes) permitting Knudsen diffusion. The partitioning wall 2 is constituted from resin film, composite-material film, or ceramic film.read more
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Device for transporting and compressing gas by using porous material
TL;DR: In this paper, a flat thermodiffusion couple consisting of porous material N such as pottery, glass, and ceramics having pores communicating with each other by the paths smaller than the mean free path of diffused gas molecules is constituted of an upper plate 51a provided with upper shielding walls, a lower plate 51b provided with lower shielding walls 53', and side plate 52; gas phase systems M and the porous materials N are alternately arranged through these plates.